SCHEMBL3338491

SCHEMBL3338491

C=C(C)C(=O)OC12CC3CC(C1)CC(OS(C)(=O)=O)(C3)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15182752 0.88
SCHEMBL737596 0.88 ALDH1A1 (0.35)
SCHEMBL1643363 0.87 CA2 (0.32)
SCHEMBL4861505 0.84
SCHEMBL4114020 0.84
SCHEMBL76543 0.83 DPP4 (0.38)
SCHEMBL16843427 0.83
SCHEMBL10053101 0.82 TSHR (0.40)
SCHEMBL18429993 0.82 ALDH1A1 (0.31)
SCHEMBL677896 0.82 ALDH1A1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1914147-A Adamantane derivative and process for producing the same IDEMITSU KOSAN CO (JP) 2007-02-14 CN claimed
WO-2025100536-A1 COPOLYMER, NONLINEAR OPTICAL MATERIAL, AND ELECTRO-OPTIC ELEMENT 大阪有機化学工業株式会社 2025-05-15 WO disclosed
US-9927708-B2 Pattern forming process and shrink agent SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-27 US disclosed
US-9927708-B2 Pattern forming process and shrink agent SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-27 US disclosed
US-9658532-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-23 US disclosed
US-9658532-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-23 US disclosed
US-9632415-B2 Pattern forming process and shrink agent SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-25 US disclosed
US-9632415-B2 Pattern forming process and shrink agent SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-25 US disclosed
US-9618850-B2 Pattern forming process and shrink agent SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-11 US disclosed
US-9618850-B2 Pattern forming process and shrink agent SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-11 US disclosed
US-7528279-B2 Adamantane derivatives and process for producing the same IDEMITSU KOSAN CO., LTD. (JP) 2009-05-05 US disclosed
EP-2048128-A1 POLYMERIZABLE COMPOUND HAVING ADAMANTANE STRUCTURE, PROCESS FOR PRODUCTION OF THE SAME, AND RESIN COMPOSITION Idemitsu Kosan Co., Ltd. (JP) 2009-04-15 EP disclosed
US-7456311-B2 Adamantane derivative, process for producing the same, and photosensitive material for photoresist IDEMITSU KOSAN CO., LTD. (JP) 2008-11-25 US disclosed
EP-1882705-A1 POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER IDEMITSU KOSAN CO., LTD. (JP) 2008-01-30 EP disclosed
US-20080009647-A1 Adamantane Derivative, Process for Producing the Same, and Photosensitive Material for Photoresist IDEMITSU KOSAN CO., LTD. (JP) 2008-01-10 US disclosed
EP-1803708-A1 ADAMANTANE DERIVATIVE, PROCESS FOR PRODUCING THE SAME, AND PHOTOSENSITIVE MATERIAL FOR PHOTORESIST IDEMITSU KOSAN CO., LTD. (JP) 2007-07-04 EP disclosed
US-20070129532-A1 Adamantane derivatives and process for producing the same IDEMITSU KOSAN CO., LTD (JP) 2007-06-07 US disclosed
US-20070129532-A1 Adamantane derivatives and process for producing the same IDEMITSU KOSAN CO., LTD (JP) 2007-06-07 US disclosed
CN-1914147-A Adamantane derivative and process for producing the same IDEMITSU KOSAN CO (JP) 2007-02-14 CN disclosed
EP-1712542-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME IDEMITSU KOSAN CO., LTD. (JP) 2006-10-18 EP disclosed