Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.35 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | HTR2A | P28223 | 1/20 | 0.31 |
| ▸ | HTR2C | P28335 | 1/20 | 0.31 |
| ▸ | HTR2B | P41595 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17710559 | 0.89 | ALDH1A1 (0.30) | ALDH1A1TSHRATMNPSR1 | |
| SCHEMBL17710471 | 0.89 | ALDH1A1 (0.30) | ALDH1A1TSHRATMNPSR1 | |
| SCHEMBL17710573 | 0.89 | CYP1A2 (0.35) | ALDH1A1TSHRATMNPSR1 | |
| SCHEMBL11046761 | 0.86 | HTR2A (0.32) | ALDH1A1TSHRATMNPSR1HTR2A | |
| SCHEMBL166962 | 0.83 | CYP1A2 (0.38) | ALDH1A1TSHRATMNPSR1HTR2A | |
| SCHEMBL4379538 | 0.81 | HTR2A (0.39) | ALDH1A1TSHRATMNPSR1HTR2A | |
| SCHEMBL10803893 | 0.80 | HTR2A (0.34) | ALDH1A1TSHRATMNPSR1HTR2A | |
| SCHEMBL1041549 | 0.80 | TSHR (0.33) | ALDH1A1TSHRATMNPSR1 | |
| SCHEMBL18123684 | 0.80 | IDO1 (0.32) | ALDH1A1TSHRATMNPSR1 | |
| SCHEMBL1615169 | 0.79 | IDH1 (0.39) | HTR2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260035490-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries I, LLC | 2026-02-05 | — | — | US | claimed |
| CN-119556524-A | Negative photosensitive resin composition for spacer | 上海玟昕科技有限公司 | 2025-03-04 | — | — | CN | claimed |
| US-11421049-B2 | Photopolymerization synergist | Piedmont Chemical Industries, LLC (US) | 2022-08-23 | — | — | US | claimed |
| WO-2021096751-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries, LLC (US) | 2021-05-20 | — | — | WO | claimed |
| US-20210139616-A1 | Photopolymerization Synergist | Piedmont Chemical Industries, LLC | 2021-05-13 | — | — | US | claimed |
| US-8098012-B2 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2012-01-17 | — | — | US | claimed |
| US-20090317604-A1 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2009-12-24 | — | — | US | claimed |
| US-7588877-B2 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2009-09-15 | — | — | US | claimed |
| US-7378223-B2 | a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble cellulose ester compound, d) a photopolymerization initiator selected from triazines, benzophenones, acetonphenones, phosphine oxides e) a solvent(MEK) | DONGJIN SEMICHEM, CO., LTD. (KR) | 2008-05-27 | — | — | US | claimed |
| US-7300606-B2 | Pb free Ag paste composition for PDP address electrode | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-11-27 | — | — | US | claimed |
| WO-2007123324-A1 | PASTE COMPOSITION FOR PRINTING | DONGJIN SEMICHEM CO., LTD (KR) | 2007-11-01 | — | — | WO | claimed |
| US-20070060729-A1 | Photosensitive resin composition and dry film resist using the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-03-15 | — | — | US | claimed |
| US-20060115767-A1 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD., A CORPORATION ORGANIZED UNDER THE LAWS OF THE REPUBLIC OF KOREA (KR) | 2006-06-01 | — | — | US | claimed |
| US-20060011895-A1 | Pb free Ag paste composition for PDP address electrode | DONGJIN SEMICHEM CO., LTD. (KR) | 2006-01-19 | — | — | US | claimed |
| US-20050255405-A1 | Photoresist resin composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2005-11-17 | — | — | US | claimed |
| WO-2004099876-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM RESIST USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-11-18 | — | — | WO | claimed |
| WO-2004072736-A1 | AG PASTE COMPOSITION FOR MICROELECTRODE FORMATION AND MICROELECTRODE FORMED USING THE SAME | DONGJIN SEMICHEM CO. LTD. (KR) | 2004-08-26 | — | — | WO | claimed |
| US-20260035490-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries I, LLC | 2026-02-05 | — | — | US | disclosed |
| US-20040115558-A1 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | DONGJIM SEMICHEM CO., LTD. (KR) | 2004-06-17 | — | — | US | disclosed |
| CN-1497343-A | Photoresist compound using photoresist | 东进瑟弥侃株式会社 | 2004-05-19 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260035490-A1 | PHOTOPOLYMERIZATION SYNERGIST | EEF1D, ARCN1, RPS4Y1 | GABRA1 1300/4885GABRB2 2139/4885ALDH1A1 788/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.