SCHEMBL166962

SCHEMBL166962

CCc1ccc2c(c1)Cc1ccccc1[S+]2[O-]

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.38
CYP2A6 P11509 1/20 0.38
NPC1 O15118 3/20 0.37
RAB9A P51151 3/20 0.37
KDM4E B2RXH2 1/20 0.37
ALDH1A1 P00352 3/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
MAPT P10636 2/20 0.34
MAPK1 P28482 2/20 0.34
LMNA P02545 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
SLC6A2 P23975 2/20 0.34
SLC6A4 P31645 2/20 0.34
SLC6A3 Q01959 1/20 0.34
TSHR P16473 3/20 0.33
ATM Q13315 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
DRD2 P14416 1/20 0.33
HTR2A P28223 1/20 0.33
HTR2C P28335 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7044069 0.92 TRPA1 (0.36) CYP1A2CYP2A6NPC1RAB9AKDM4E
SCHEMBL6860681 0.90 CYP1A2 (0.38) CYP1A2CYP2A6NPC1RAB9AKDM4E
SCHEMBL4379538 0.88 HTR2A (0.39) ALDH1A1SLC6A2SLC6A4TSHRATM
SCHEMBL11053479 0.85 HTR2A (0.46) SMN1; SMN2SLC6A2SLC6A4DRD2HTR2A
SCHEMBL1041549 0.84 TSHR (0.33) NPC1RAB9AALDH1A1SMN1; SMN2MAPK1
SCHEMBL10803893 0.84 HTR2A (0.34) NPC1RAB9AALDH1A1SMN1; SMN2MAPK1
SCHEMBL18123684 0.84 IDO1 (0.32) NPC1RAB9AALDH1A1SMN1; SMN2MAPK1
SCHEMBL11049835 0.84 HTR2A (0.51) SLC6A2SLC6A4DRD2HTR2AHTR2C
SCHEMBL333858 0.83 GABRA1 (0.35) ALDH1A1TSHRATMNPSR1HTR2A
SCHEMBL11049852 0.83 HTR2A (0.53) KDM4EALDH1A1LMNASLC6A2SLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3268 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025041606-A1 METHOD FOR CURING PHOTOCURABLE COMPOSITION THROUGH UV-LED IRRADIATION, AND METHOD FOR PRODUCING CURED PRODUCT OF SAID PHOTOCURABLE COMPOSITION 信越化学工業株式会社 2025-02-27 WO claimed
CN-117965087-A Anti-dazzle coating, anti-dazzle hardening film and preparation method 宁波惠之星新材料科技股份有限公司 2024-05-03 CN claimed
CN-115785730-A UV (ultraviolet) light-cured solder resist ink and preparation method thereof 东莞智炜新材料股份有限公司 2023-03-14 CN claimed
CN-110205043-B Cutting adhesive tape for processing semiconductor material and preparation method thereof 广东硕成科技有限公司 2021-07-16 CN claimed
CN-110791150-A Curable resin composition for inkjet, printed wiring board, and method for producing printed wiring board 株式会社田村制作所 2020-02-14 CN claimed
EP-2820073-B1 GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK ELECTRONICS FOR IMAGING INC (US) 2018-09-05 EP claimed
US-10005915-B2 High-stretch energy curable inks and method of use in heat transfer label applications SUN CHEMICAL CORPORATION (US) 2018-06-26 US claimed
EP-3257677-A1 INKS OR COATINGS AND METHOD OF USE IN HEAT TRANSFER LABEL APPLICATIONS Sun Chemical Corporation (US) 2017-12-20 EP claimed
US-9816016-B2 Adhesive composition, polarizing plate and liquid crystal display device LG CHEM, LTD. (KR) 2017-11-14 US claimed
US-9487680-B2 Pressure sensitive adhesive compositions, polarizers and liquid crystal displays comprising the same LG CHEM, LTD. (KR) 2016-11-08 US claimed
WO-2009131321-A2 PRESSURE-SENSITIVE ADHESIVE COMPOSITIONS, POLARIZERS AND LIQUID CRYSTAL DISPLAYS COMPRISING THE SAME LG CHEM, LTD. (KR) 2009-10-29 WO claimed
US-6815140-B2 COMPRISING A NOVOLAC RESIN, A RADIATION-SENSITIVE QUINONEDIAZIDE COMPOUND, AND ALSO A THIOXANTHONE COMPOUND TO IMPROVE RESOLUTION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-09 US claimed
US-20020006574-A1 Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-17 US claimed
US-20010026905-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2001-10-04 US claimed
EP-0626431-B1 PHOTOCURABLE CONDUCTIVE COATING COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2000-01-26 EP claimed
EP-0962826-A1 A positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-12-08 EP claimed
US-5998013-A CURED PRODUCT OF AN ULTRAVIOLET-CURING RESIN AND AGGLOMERATES OF COLLOIDAL SILICA PARTICLES FORMED WITH AN AMINE LINTEC CORPORATION (JP) 1999-12-07 US claimed
US-5429846-A Antimony oxide-containing tin oxide powder, (meth) acrylate compound, acetal resin, photopolymerization initiator and organic solvent SEKISUI CHEMICAL CO., LTD. (JP) 1995-07-04 US claimed
EP-0626431-A1 PHOTOCURABLE CONDUCTIVE COATING COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 1994-11-30 EP claimed
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US claimed