Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR2 | P34972 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2962838 | 0.76 | CNR2 (0.35) | CNR2 | |
| SCHEMBL2970651 | 0.76 | CNR2 (0.33) | CNR2 | |
| SCHEMBL10536184 | 0.67 | GRM2 (0.33) | CNR2 | |
| SCHEMBL10538607 | 0.67 | ALDH1A1 (0.39) | CNR2 | |
| SCHEMBL27757795 | 0.63 | TYR (0.34) | CNR2 | |
| SCHEMBL3335785 | 0.63 | NPC1 (0.33) | CNR2 | |
| SCHEMBL15018982 | 0.63 | NPC1 (0.33) | CNR2 | |
| SCHEMBL10536897 | 0.62 | CNR2 (0.35) | CNR2 | |
| SCHEMBL4227889 | 0.61 | ALDH1A1 (0.46) | — | |
| SCHEMBL4397436 | 0.60 | NOS2 (0.36) | CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9418890-B2 | Method for tuning a deposition rate during an atomic layer deposition process | APPLIED MATERIALS, INC. (US) | 2016-08-16 | — | — | US | disclosed |
| US-7682946-B2 | flowing a process gas through a conduit to form a circular gas flow pattern, exposing a substrate to the circular gas flow pattern, pulsing a organoruthanium precursor into the process gas and igniting a plasma of ammonia, N2, H2 from the process gas to deposit a material on the substrate (Ru, Ta, W ) | APPLIED MATERIALS, INC. (US) | 2010-03-23 | — | — | US | disclosed |
| US-20070128864-A1 | APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION | APPLIED MATERIALS, INC. | 2007-06-07 | — | — | US | disclosed |
| US-20070119371-A1 | APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION | APPLIED MATERIALS, INC. | 2007-05-31 | — | — | US | disclosed |