Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.32 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 2/20 | 0.31 |
| ▸ | CA2 | P00918 | 2/20 | 0.31 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.31 |
| ▸ | TTR | P02766 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL163507 | 0.89 | TAAR1 (0.37) | CYP4A11CYP4F2CA2TAAR1 | |
| SCHEMBL14454634 | 0.84 | CYP4A11 (0.32) | CYP4A11CYP4F2CA1CA2TAAR1 | |
| SCHEMBL14498249 | 0.82 | TAAR1 (0.36) | CYP4A11CYP4F2TAAR1 | |
| SCHEMBL387841 | 0.82 | CYP1A2 (0.45) | TAAR1 | |
| SCHEMBL680307 | 0.82 | TAAR1 (0.36) | CYP4A11CYP4F2TAAR1TTRPOLB | |
| SCHEMBL929249 | 0.81 | CYP4F2 (0.32) | CYP4A11CYP4F2 | |
| SCHEMBL15735387 | 0.80 | TAAR1 (0.44) | TAAR1POLB | |
| SCHEMBL17656478 | 0.80 | TAAR1 (0.53) | TAAR1 | |
| SCHEMBL8953980 | 0.80 | GFER (0.50) | TAAR1 | |
| SCHEMBL8961179 | 0.80 | LOXL2 (0.40) | TAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230302533-A1 | Additive Manufacturing Powder And Additively Manufactured Body | SEIKO EPSON CORPORATION (JP) | 2023-09-28 | — | — | US | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |