Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1B | P49286 | 4/20 | 0.35 |
| ▸ | MTNR1A | P48039 | 3/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.33 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.33 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL333922 | 0.73 | CYP3A4 (0.38) | MTNR1BMTNR1ACYP3A4TSHRADRA2A | |
| SCHEMBL30232003 | 0.73 | CYP3A4 (0.38) | MTNR1BMTNR1ACYP3A4TSHRADRA2A | |
| SCHEMBL3897137 | 0.71 | HTR3B (0.34) | ADRA2AADRA2C | |
| SCHEMBL6325387 | 0.71 | HTR3B (0.34) | ADRA2AADRA2C | |
| SCHEMBL28989799 | 0.71 | ADRA2A (0.36) | MTNR1BMTNR1ACYP3A4TSHRADRA2A | |
| SCHEMBL28646514 | 0.71 | KDM4E (0.41) | MTNR1BMTNR1ACYP3A4TSHRADRA2A | |
| SCHEMBL27291641 | 0.69 | ADRA2A (0.40) | MTNR1BMTNR1AADRA2AADRA2BADRA2C | |
| SCHEMBL1191865 | 0.68 | TSHR (0.41) | CYP3A4TSHRADRA2AADRA2BADRA2C | |
| SCHEMBL524779 | 0.66 | — | — | |
| SCHEMBL25381760 | 0.66 | PDPK1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8445620-B2 | Elastic propylene-alpha-olefin copolymer compositions and processes to produce them | EXXONMOBIL RESEARCH AND ENGINEERING COMPANY (US) | 2013-05-21 | — | — | US | claimed |
| US-20130035442-A1 | ELASTIC PROPYLENE-ALPHA-OLEFIN COPOLYMER COMPOSITIONS AND PROCESSES TO PRODUCE THEM | EXXONMOBIL RESEARCH AND ENGINEERING COMPANY (US) | 2013-02-07 | — | — | US | claimed |
| WO-2021060384-A1 | COMPOUND, MATERIAL FOR ORGANIC ELECTROLUMINESCENT ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, AND ELECTRONIC DEVICE | 出光興産株式会社 | 2021-04-01 | — | — | WO | disclosed |
| US-8546062-B2 | Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-01 | — | — | US | disclosed |
| US-8445620-B2 | Elastic propylene-alpha-olefin copolymer compositions and processes to produce them | EXXONMOBIL RESEARCH AND ENGINEERING COMPANY (US) | 2013-05-21 | — | — | US | disclosed |
| US-20130035442-A1 | ELASTIC PROPYLENE-ALPHA-OLEFIN COPOLYMER COMPOSITIONS AND PROCESSES TO PRODUCE THEM | EXXONMOBIL RESEARCH AND ENGINEERING COMPANY (US) | 2013-02-07 | — | — | US | disclosed |
| US-20120070782-A1 | SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-22 | — | — | US | disclosed |
| US-8097401-B2 | Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-01-17 | — | — | US | disclosed |
| EP-2389359-A1 | SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME | International Business Machines Corporation (US) | 2011-11-30 | — | — | EP | disclosed |
| US-8041137-B2 | Tiled output mode for image sensors | BROADCOM CORPORATION (US) | 2011-10-18 | — | — | US | disclosed |
| WO-2010111345-A1 | SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-09-30 | — | — | WO | disclosed |
| US-20100248145-A1 | SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-09-30 | — | — | US | disclosed |
| EP-1934654-B1 | METHOD OF FORMING A PATTERNED MATERIAL FEATURE ON A SUBSTRATE UTILISING A TOP ANTIREFLECTIVE COATING COMPOSITION WITH LOW REFRACTIVE INDEX AT 193NM RADIATION WAVELENGTH | IBM (US) | 2010-01-20 | — | — | EP | disclosed |
| US-7544750-B2 | Top antireflective coating composition with low refractive index at 193nm radiation wavelength | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-09 | — | — | US | disclosed |
| EP-1934654-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION WITH LOW REFRACTIVE INDEX AT 193NM RADIATION WAVELENGTH | International Business Machines Corporation (US) | 2008-06-25 | — | — | EP | disclosed |
| US-20070087285-A1 | Top antireflective coating composition with low refractive index at 193nm radiation wavelength | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-19 | — | — | US | disclosed |
| WO-2007042348-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION WITH LOW REFRACTIVE INDEX AT 193NM RADIATION WAVELENGTH | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-19 | — | — | WO | disclosed |