Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR1 | P21554 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 1/20 | 0.32 |
| ▸ | KDM1A | O60341 | 5/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3337524 | 0.86 | CNR1 (0.32) | CNR1CNR2KDM1A | |
| SCHEMBL821694 | 0.84 | KDM1A (0.32) | CNR1CNR2KDM1A | |
| SCHEMBL444998 | 0.82 | CYP2C19 (0.36) | — | |
| SCHEMBL2448885 | 0.81 | ALDH1A1 (0.31) | CNR1CNR2 | |
| SCHEMBL3301162 | 0.81 | CYP2C19 (0.35) | — | |
| SCHEMBL19136046 | 0.79 | — | — | |
| SCHEMBL1135938 | 0.79 | CYP2C19 (0.44) | KDM1A | |
| SCHEMBL821376 | 0.79 | KDM1A (0.34) | CNR1CNR2KDM1A | |
| SCHEMBL30325785 | 0.77 | ALDH1A1 (0.37) | KDM1A | |
| SCHEMBL12002879 | 0.77 | PAOX (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-6399212-B1 | COATINGS WITH ORGANOSILICON COMPOUNDS AND SOLUTION OF SILICOFLUORIC ACID AND SILICON DIOXIDE | NIPPON SHEET GLASS CO., LTD. (JP) | 2002-06-04 | — | — | US | disclosed |
| EP-1094090-A2 | Silicon dioxide-coated polyolefin resin and process for its production | NIPPON SHEET GLASS CO. LTD. (JP) | 2001-04-25 | — | — | EP | disclosed |