Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 3/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.50 |
| ▸ | GLA | P06280 | 3/20 | 0.50 |
| ▸ | MAPT | P10636 | 2/20 | 0.50 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.48 |
| ▸ | MAOA | P21397 | 2/20 | 0.47 |
| ▸ | MAOB | P27338 | 1/20 | 0.47 |
| ▸ | KDM1A | O60341 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.42 |
| ▸ | HPGD | P15428 | 3/20 | 0.42 |
| ▸ | CASP1 | P29466 | 2/20 | 0.42 |
| ▸ | CASP7 | P55210 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.42 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
| ▸ | NQO2 | P16083 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11165792 | 0.83 | SMN1; SMN2 (0.40) | KDM4EKMT2AMAPTKCNA3ALDH1A1 | |
| SCHEMBL3343356 | 0.81 | POLB (0.57) | POLBKDM4EKMT2AGLAMAPT | |
| SCHEMBL19583344 | 0.79 | POLB (0.55) | POLBKDM4EKMT2AGLAMAPT | |
| SCHEMBL10694110 | 0.78 | L3MBTL1 (0.50) | KDM4EKMT2AGLAKCNA3MAOA | |
| SCHEMBL3349292 | 0.76 | POLB (0.61) | POLBKDM4EKMT2AGLAMAPT | |
| SCHEMBL29488275 | 0.76 | POLB (0.61) | POLBKDM4EKMT2AGLAMAPT | |
| SCHEMBL21694025 | 0.74 | SMN1; SMN2 (0.40) | KDM4EMAPTKCNA3ALDH1A1HPGD | |
| SCHEMBL27914444 | 0.74 | PDE5A (0.56) | POLBKDM4EKMT2AGLAMAPT | |
| SCHEMBL4957181 | 0.73 | KMT2A (0.46) | POLBKDM4EKMT2AGLAMAPT | |
| SCHEMBL17423220 | 0.72 | KDM4E (0.78) | POLBKDM4EKMT2AGLAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| EP-3339331-B1 | COMPOSITION | ADEKA CORP (JP) | 2022-02-16 | — | — | EP | disclosed |
| CN-108419438-B | Coloring composition | 株式会社艾迪科 | 2021-10-01 | — | — | CN | disclosed |
| CN-112154167-A | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2020-12-29 | — | — | CN | disclosed |
| CN-111566173-A | Coating composition, method for curing the composition, barrier film, and method for producing cured product | 株式会社艾迪科 | 2020-08-21 | — | — | CN | disclosed |
| CN-111221215-A | Photosensitive resin composition and application thereof | 常州强力先端电子材料有限公司 | 2020-06-02 | — | — | CN | disclosed |
| WO-2020021969-A1 | COMPOSITION, CURED PRODUCT, OPTICAL FILTER, AND PRODUCTION METHOD FOR CURED PRODUCT | 株式会社ADEKA | 2020-01-30 | — | — | WO | disclosed |
| CN-110357989-A | Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application | 常州强力电子新材料股份有限公司 | 2019-10-22 | — | — | CN | disclosed |
| EP-3339331-A1 | COMPOSITION | Adeka Corporation (JP) | 2018-06-27 | — | — | EP | disclosed |
| CN-102844709-B | Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board | NICHIGO MORTON CO LTD | 2014-08-20 | — | — | CN | disclosed |
| CN-102844709-A | Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board | NICHIGO MORTON CO LTD | 2012-12-26 | — | — | CN | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| CN-101568882-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-10-28 | — | — | CN | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |