SCHEMBL3343356

SCHEMBL3343356

CCCOc1c2ccccc2nc2ccccc12

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.57
KDM4E B2RXH2 4/20 0.53
ALDH1A1 P00352 3/20 0.53
GAA P10253 2/20 0.53
HPGD P15428 2/20 0.53
MAPT P10636 5/20 0.50
KMT2A Q03164 3/20 0.50
GLA P06280 1/20 0.50
CYP1A2 P05177 1/20 0.49
CYP2C19 P33261 1/20 0.49
TP53 P04637 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
KCNA3 P22001 1/20 0.48
TLR8 Q9NR97 1/20 0.46
PDE10A Q9Y233 1/20 0.46
TOP2A P11388 2/20 0.46
NPSR1 Q6W5P4 2/20 0.45
MEN1 O00255 1/20 0.45
L3MBTL1 Q9Y468 2/20 0.44
OPRM1 P35372 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19583344 0.91 POLB (0.55) POLBKDM4EALDH1A1GAAHPGD
SCHEMBL3349292 0.84 POLB (0.61) POLBKDM4EALDH1A1GAAHPGD
SCHEMBL29488275 0.84 POLB (0.61) POLBKDM4EALDH1A1GAAHPGD
SCHEMBL29363872 0.83 ALDH1A1 (0.46) KDM4EALDH1A1GAAHPGDMAPT
SCHEMBL487367 0.83 ALDH1A1 (0.46) KDM4EALDH1A1GAAHPGDMAPT
SCHEMBL13156570 0.82 TLR8 (0.49) POLBKDM4EALDH1A1GAAHPGD
SCHEMBL3343039 0.81 POLB (0.52) POLBKDM4EALDH1A1GAAHPGD
SCHEMBL29371827 0.78 TLR8 (0.44) KMT2ACYP1A2TLR8MEN1L3MBTL1
SCHEMBL7966951 0.78 TLR8 (0.44) KMT2ACYP1A2TLR8MEN1L3MBTL1
SCHEMBL14046155 0.78 GAA (0.54) POLBKDM4EALDH1A1GAAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US claimed
CN-111315828-B Composition, cured product, optical filter, and method for producing cured product 株式会社艾迪科 2023-09-29 CN disclosed
CN-112154167-B Composition, cured product, optical filter, and method for producing cured product 株式会社艾迪科 2023-08-22 CN disclosed
EP-3339331-B1 COMPOSITION ADEKA CORP (JP) 2022-02-16 EP disclosed
WO-2020021969-A1 COMPOSITION, CURED PRODUCT, OPTICAL FILTER, AND PRODUCTION METHOD FOR CURED PRODUCT 株式会社ADEKA 2020-01-30 WO disclosed
EP-3339331-A1 COMPOSITION Adeka Corporation (JP) 2018-06-27 EP disclosed
US-20170329220-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING CIRCUIT SUBSTRATE HITACHI CHEMICAL COMPANY, LTD. (JP) 2017-11-16 US disclosed
US-20100159691-A1 PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE ASAHI KASEI EMD CORPORATION (JP) 2010-06-24 US disclosed
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US disclosed