Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | GLA | P06280 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | PGR | P06401 | 1/20 | 0.49 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.49 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.49 |
| ▸ | HTR2A | P28223 | 1/20 | 0.49 |
| ▸ | HRH1 | P35367 | 1/20 | 0.49 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.49 |
| ▸ | NR1H2 | P55055 | 4/20 | 0.44 |
| ▸ | NR1H3 | Q13133 | 4/20 | 0.44 |
| ▸ | TP53 | P04637 | 4/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3343171 | 1.00 | ALDH1A1 (0.50) | ALDH1A1GLATSHRPGRADRA2A | |
| Hydrochloric Acid SCHEMBL8940097 | 0.98 | ALDH1A1 (0.48) | ALDH1A1GLATSHRPGRADRA2A | |
| SCHEMBL9632865 | 0.85 | TP53 (0.46) | ALDH1A1GLATSHRPGRADRA2A | |
| SCHEMBL9632869 | 0.85 | TP53 (0.46) | ALDH1A1GLATSHRPGRADRA2A | |
| SCHEMBL4667661 | 0.85 | ALDH1A1 (0.47) | ALDH1A1GLATSHRPGRADRA2A | |
| SCHEMBL11864037 | 0.83 | TP53 (0.47) | ALDH1A1GLATSHRTP53SMN1; SMN2 | |
| SCHEMBL8530908 | 0.83 | ALDH1A1 (0.42) | ALDH1A1GLATSHRPGRADRA2A | |
| SCHEMBL547805 | 0.83 | SMN1; SMN2 (0.42) | ALDH1A1GLATSHRPGRADRA2A | |
| SCHEMBL27537083 | 0.83 | ALDH1A1 (0.42) | ALDH1A1GLATSHRPGRADRA2A | |
| SCHEMBL9676347 | 0.82 | ALDH1A1 (0.52) | ALDH1A1GLATSHRPGRADRA2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | claimed |
| CN-118159908-A | Photosensitive element and method for forming resist pattern | 旭化成株式会社 | 2024-06-07 | — | — | CN | disclosed |
| WO-2024085254-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2024-04-25 | — | — | WO | disclosed |
| WO-2023074325-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2023-05-04 | — | — | WO | disclosed |
| CN-101779165-B | Photosensitive resin composition and laminate thereof | ASAHI KASEI E MATERIALS CORP | 2014-09-24 | — | — | CN | disclosed |
| CN-101449208-B | Photosensitive resin composition and laminate | ASAHI KASEI E-MATERIALS CORP. (JP) | 2011-12-14 | — | — | CN | disclosed |
| CN-101779165-A | Photosensitive resin composition and laminate thereof | ASAHI KASEI EMD CORP | 2010-07-14 | — | — | CN | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| CN-101449208-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-06-03 | — | — | CN | disclosed |
| CN-101075090-A | Dry film corrosion resisting agent | ASAHI CHEMICAL ELECTRONIC MATE (JP) | 2007-11-21 | — | — | CN | disclosed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | disclosed |