SCHEMBL9632869

SCHEMBL9632869

CCCN(c1ccccc1)[C@@H](C)C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 3/20 0.46
ALDH1A1 P00352 4/20 0.43
GLA P06280 1/20 0.43
TSHR P16473 1/20 0.43
PGR P06401 1/20 0.42
ADRA2A P08913 1/20 0.42
ADRA2B P18089 1/20 0.42
HTR2A P28223 1/20 0.42
HRH1 P35367 1/20 0.42
KCNH2 Q12809 1/20 0.42
SMN1; SMN2 Q16637 3/20 0.41
LMNA P02545 2/20 0.41
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
KMT2A Q03164 2/20 0.40
JAK2 O60674 1/20 0.40
PAX8 Q06710 1/20 0.40
ESR1 P03372 1/20 0.40
MEN1 O00255 1/20 0.40
CYP3A4 P08684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9632865 1.00 TP53 (0.46) TP53ALDH1A1GLATSHRPGR
SCHEMBL3342832 0.90 ALDH1A1 (0.45) TP53ALDH1A1GLATSHRPGR
SCHEMBL3342836 0.90 ALDH1A1 (0.45) TP53ALDH1A1GLATSHRPGR
SCHEMBL11031009 0.88 NPC1 (0.50) TP53ALDH1A1GLATSHRPGR
SCHEMBL10782208 0.88 NPC1 (0.50) TP53ALDH1A1GLATSHRPGR
SCHEMBL3343171 0.85 ALDH1A1 (0.50) TP53ALDH1A1GLATSHRPGR
SCHEMBL3343176 0.85 ALDH1A1 (0.50) TP53ALDH1A1GLATSHRPGR
SCHEMBL30830720 0.84 TP53 (0.41) TP53ALDH1A1GLATSHRPGR
Hydrochloric Acid SCHEMBL8940097 0.84 ALDH1A1 (0.48) TP53ALDH1A1GLATSHRPGR
SCHEMBL27616536 0.83 NR1H2 (0.44) TP53ALDH1A1GLATSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US claimed
WO-2024085254-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-04-25 WO disclosed
WO-2023074325-A1 PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2023-05-04 WO disclosed
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US disclosed
EP-0295044-B1 PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME Hitachi Chemical Co., Ltd. (JP) 1992-04-22 EP disclosed
US-4987057-A HIGH SENSITIVITY TO VISIBLE LIGHT RAYS HITACHI CHEMICAL CO., LTD. (JP) 1991-01-22 US disclosed
EP-0295044-A2 Photoinitiator and photopolymerizable composition using the same Hitachi Chemical Co., Ltd. (JP) 1988-12-14 EP disclosed