Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 1.00 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 1.00 |
| ▸ | HPGD | P15428 | 2/20 | 1.00 |
| ▸ | GAA | P10253 | 2/20 | 1.00 |
| ▸ | ELANE | P08246 | 1/20 | 0.51 |
| ▸ | TLR8 | Q9NR97 | 5/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | GLA | P06280 | 3/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | MAOA | P21397 | 2/20 | 0.46 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acridine SCHEMBL21810741 | 0.91 | KDM4E (0.82) | KDM4EALDH1A1HPGDGAAELANE | |
| SCHEMBL3731476 | 0.88 | KDM4E (0.78) | KDM4EALDH1A1HPGDGAATLR8 | |
| SCHEMBL321444 | 0.86 | KDM4E (0.75) | KDM4EALDH1A1HPGDGAATLR8 | |
| SCHEMBL29446776 | 0.86 | KDM4E (0.75) | KDM4EALDH1A1HPGDGAATLR8 | |
| SCHEMBL5318703 | 0.86 | KDM4E (0.75) | KDM4EALDH1A1HPGDGAATLR8 | |
| SCHEMBL5319761 | 0.84 | KDM4E (0.72) | KDM4EALDH1A1HPGDGAATLR8 | |
| SCHEMBL21633651 | 0.84 | KDM4E (0.72) | KDM4EALDH1A1HPGDGAATLR8 | |
| SCHEMBL2537670 | 0.84 | KDM4E (0.72) | KDM4EALDH1A1HPGDGAATLR8 | |
| SCHEMBL5318248 | 0.84 | KDM4E (0.72) | KDM4EALDH1A1HPGDGAATLR8 | |
| SCHEMBL9434493 | 0.84 | KDM4E (0.72) | KDM4EALDH1A1HPGDGAATLR8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 318 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118290657-A | Photocurable composition and application thereof | 常州强力先端电子材料有限公司 | 2024-07-05 | — | — | CN | claimed |
| CN-116413999-A | Photosensitive resin composition, photoresist, black matrix and color filter comprising the same | 常州强力电子新材料股份有限公司 | 2023-07-11 | — | — | CN | claimed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-111752097-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752098-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-106233205-B | Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package | 日立化成株式会社 | 2020-06-23 | — | — | CN | claimed |
| CN-101788766-B | Photosensitive resin composition | LG CHEMICAL LTD | 2012-12-26 | — | — | CN | claimed |
| CN-101290471-B | Photoresist combination and laminating body | ASAHI KASEI EMD CORP | 2011-07-06 | — | — | CN | claimed |
| CN-101788766-A | Photosensitive resin composition | LG CHEMICAL LTD | 2010-07-28 | — | — | CN | claimed |
| CN-101290471-A | Photoresist combination and laminating body | ASAHI KASEI EMD CORP (JP) | 2008-10-22 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| CN-118290657-A | Photocurable composition and application thereof | 常州强力先端电子材料有限公司 | 2024-07-05 | — | — | CN | disclosed |
| CN-118265952-A | Photosensitive resin composition, display panel manufactured using the same, and manufacturing method thereof | 三星显示有限公司 | 2024-06-28 | — | — | CN | disclosed |
| CN-114222947-B | Adhesive resin, negative photosensitive resin composition, and display device including black bank formed using the same | 株式会社LG化学 | 2024-05-28 | — | — | CN | disclosed |
| CN-111971621-B | Colorant composition, photosensitive material, color filter and display device | 株式会社LG化学 | 2024-05-07 | — | — | CN | disclosed |
| CN-1608303-A | Composition for dielectric material for use in plasma display panel, laminate for dielectric material, method for forming dielectric material | TOKYO OHKA KOGYO CO LTD (JP) | 2005-04-20 | — | — | CN | disclosed |
| CN-1432141-A | Photosensitive resin composition, photosensitive element, method for producing protective layer pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2003-07-23 | — | — | CN | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-5334484-A | Using an acridine compound as photoinitiator | HITACHI CHEMICAL CO., LTD. (JP) | 1994-08-02 | — | — | US | disclosed |