SCHEMBL3347747

SCHEMBL3347747

C=C(Cc1c(O)ccc2ccccc12)C(=O)O

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 8/20 0.71
ALDH1A1 P00352 6/20 0.71
GAA P10253 5/20 0.71
HSD17B10 Q99714 2/20 0.71
HPGD P15428 2/20 0.71
GLA P06280 1/20 0.71
CYP1A2 P05177 2/20 0.56
CYP2C9 P11712 1/20 0.56
CYP2C19 P33261 1/20 0.56
MAPT P10636 6/20 0.53
TAAR1 Q96RJ0 1/20 0.53
KMT2A Q03164 4/20 0.52
MEN1 O00255 1/20 0.52
TDP1 Q9NUW8 3/20 0.49
HTT P42858 1/20 0.47
CRHBP P24387 1/20 0.44
CRHR2 Q13324 1/20 0.44
CYP2D6 P10635 1/20 0.43
HIF1A Q16665 1/20 0.43
LMNA P02545 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3426377 0.84 KDM4E (0.49) KDM4EALDH1A1GAAHSD17B10HPGD
SCHEMBL4889683 0.83 KDM4E (1.00) KDM4EALDH1A1GAAHSD17B10HPGD
SCHEMBL1497455 0.81 KDM4E (0.48) KDM4EALDH1A1GAAHSD17B10HPGD
SCHEMBL208867 0.80 KDM4E (0.45) KDM4EALDH1A1GAAHSD17B10HPGD
SCHEMBL23499977 0.78 KDM4E (0.72) KDM4EALDH1A1GAAHSD17B10HPGD
SCHEMBL6622985 0.78 KDM4E (0.72) KDM4EALDH1A1GAAHSD17B10HPGD
SCHEMBL23276640 0.78 KDM4E (0.72) KDM4EALDH1A1GAAHSD17B10HPGD
SCHEMBL819647 0.75 TDP1 (0.68) KDM4EHPGDCYP1A2MAPTKMT2A
SCHEMBL21438254 0.74 KDM4E (0.66) KDM4EALDH1A1GAAHSD17B10HPGD
SCHEMBL8890863 0.73 KDM4E (0.70) KDM4EALDH1A1GAAHSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8507173-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-20100159404-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 US disclosed