SCHEMBL3348754

SCHEMBL3348754

N#CCCc1c2ccccc2nc2ccccc12

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.58
KDM4E B2RXH2 6/20 0.58
HPGD P15428 3/20 0.58
GAA P10253 2/20 0.58
KMT2A Q03164 5/20 0.47
SMN1; SMN2 Q16637 4/20 0.47
HTT P42858 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
EGFR P00533 1/20 0.46
LMNA P02545 4/20 0.44
GLA P06280 3/20 0.44
CASP1 P29466 3/20 0.44
CASP7 P55210 3/20 0.44
HSD17B10 Q99714 3/20 0.44
RAB9A P51151 2/20 0.44
POLB P06746 2/20 0.44
TP53 P04637 1/20 0.44
MAPT P10636 1/20 0.44
TSHR P16473 1/20 0.44
RAD52 P43351 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL321444 0.81 KDM4E (0.75) ALDH1A1KDM4EHPGDGAAKMT2A
SCHEMBL29446776 0.81 KDM4E (0.75) ALDH1A1KDM4EHPGDGAAKMT2A
SCHEMBL3676439 0.80 KDM4E (0.55) ALDH1A1KDM4EHPGDGAAKMT2A
SCHEMBL2385532 0.78 L3MBTL1 (0.50) ALDH1A1KDM4EHPGDKMT2ASMN1; SMN2
SCHEMBL320907 0.77 KDM4E (0.69) ALDH1A1KDM4EHPGDGAAKMT2A
SCHEMBL29446754 0.77 KDM4E (0.69) ALDH1A1KDM4EHPGDGAAKMT2A
SCHEMBL29385771 0.77 KDM4E (0.69) ALDH1A1KDM4EHPGDGAAKMT2A
SCHEMBL321679 0.77 KDM4E (0.69) ALDH1A1KDM4EHPGDGAAKMT2A
SCHEMBL601351 0.75 KDM4E (0.67) ALDH1A1KDM4EHPGDGAAKMT2A
SCHEMBL194585 0.75 KDM4E (0.67) ALDH1A1KDM4EHPGDGAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US claimed
CN-111315828-B Composition, cured product, optical filter, and method for producing cured product 株式会社艾迪科 2023-09-29 CN disclosed
CN-112154167-B Composition, cured product, optical filter, and method for producing cured product 株式会社艾迪科 2023-08-22 CN disclosed
CN-110114376-B Curable composition, method for producing cured product, cured product thereof, and adhesive using same 株式会社ADEKA 2022-06-14 CN disclosed
EP-3339331-B1 COMPOSITION ADEKA CORP (JP) 2022-02-16 EP disclosed
CN-108419438-B Coloring composition 株式会社艾迪科 2021-10-01 CN disclosed
CN-112154167-A Composition, cured product, optical filter, and method for producing cured product 株式会社艾迪科 2020-12-29 CN disclosed
CN-111566173-A Coating composition, method for curing the composition, barrier film, and method for producing cured product 株式会社艾迪科 2020-08-21 CN disclosed
WO-2020021969-A1 COMPOSITION, CURED PRODUCT, OPTICAL FILTER, AND PRODUCTION METHOD FOR CURED PRODUCT 株式会社ADEKA 2020-01-30 WO disclosed
EP-3339331-A1 COMPOSITION Adeka Corporation (JP) 2018-06-27 EP disclosed
US-20100159691-A1 PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE ASAHI KASEI EMD CORPORATION (JP) 2010-06-24 US disclosed
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US disclosed