SCHEMBL3360155

SCHEMBL3360155

O=C(O)C(c1ccccc1O)c1ccccc1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 1/20 0.50
GABRB2 P47870 1/20 0.50
TSHR P16473 1/20 0.45
HPGD P15428 3/20 0.44
CA12 O43570 3/20 0.44
CA2 P00918 3/20 0.44
CA14 Q9ULX7 3/20 0.44
KDM4E B2RXH2 2/20 0.44
ALDH1A1 P00352 2/20 0.44
CA4 P22748 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
CA1 P00915 2/20 0.44
CA7 P43166 2/20 0.44
CA9 Q16790 2/20 0.44
HMGB1 P09429 1/20 0.44
CA6 P23280 1/20 0.44
NAPRT Q6XQN6 1/20 0.44
MMP2 P08253 1/20 0.42
DBH P09172 1/20 0.42
AKR1B1 P15121 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL11785588 0.94 GABRA1 (0.45) GABRA1GABRB2TSHRHPGDCA12
Ethylenediamine SCHEMBL544736 0.90 TSHR (0.42) GABRA1GABRB2TSHRHPGDCA12
SCHEMBL11363822 0.89 MEN1 (0.50) GABRA1GABRB2TSHRHPGDMEN1
Ethylenediamine SCHEMBL5159417 0.88 TSHR (0.41) GABRA1GABRB2TSHRHPGDCA12
SCHEMBL2792375 0.88 GABRA1 (0.45) GABRA1GABRB2TSHRHPGDCA12
SCHEMBL5842467 0.83 GABRA1 (0.52) GABRA1GABRB2TSHRHPGDCA12
SCHEMBL9447445 0.81 CNR1 (0.48) GABRA1GABRB2TSHRHPGDALDH1A1
SCHEMBL2208132 0.81 SRC (0.52) GABRA1GABRB2TSHRHPGDCA12
SCHEMBL10627436 0.80 TSHR (0.45) GABRA1GABRB2TSHRHPGDCA12
SCHEMBL8983937 0.80 MEN1 (0.50) GABRA1GABRB2TSHRHPGDCA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114423851-A Detergent composition 联合利华知识产权控股有限公司 2022-04-29 CN claimed
EP-0418399-B1 COMPOSITION FOR REVERSIBLE THERMAL RECORDING MEDIUM TOPPAN PRINTING CO LTD (JP) 1996-08-28 EP claimed
US-5178669-A COMPOSITION FOR REVERSIBLE THERMAL RECORDING MEDIA TOPPAN PRINTING CO., LTD. (JP) 1993-01-12 US claimed
EP-0418399-A1 COMPOSITION FOR REVERSIBLE THERMAL RECORDING MEDIUM Toppan Printing Co., Ltd. (JP) 1991-03-27 EP claimed
EP-0154775-B1 WATER DISPERSABLE BINDER AGENTS BASED ON MODIFIED EPOXY-AMINE ADDUCTS, THEIR PREPARATION AND APPLICATION BASF Lacke + Farben AG (DE) 1989-09-20 EP claimed
EP-0145506-B1 ELIMINATION OF DEFECTS IN CYSTEINE-SENSITIZED EMULSIONS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1988-03-02 EP claimed
US-4566963-A CATIONIC POLYMERS FOR ELECTROCOATING BASF FARBEN + FASERN AG (DE) 1986-01-28 US claimed
JP-2188293-A None JP disclosed
JP-56055339-A None JP disclosed
JP-5069669-A None JP disclosed
JP-59079793-A None JP disclosed
JP-5058051-A None JP disclosed
JP-4272890-A None JP disclosed
JP-H02188293-A REVERSIBLE THERMOSENSITIVE RECORDING MEDIUM TOPPAN PRINTING CO LTD 1990-07-24 JP disclosed
US-4792544-A BENZYL HYDROXYPHENYL-PHENYLACETATE DEVELOPERS; HIGH SPEED PRINTING NIPPON GOHSEI KAGAKU KOGYO KABOSHIKI KAISHA (JP) 1988-12-20 US disclosed
US-4566963-A CATIONIC POLYMERS FOR ELECTROCOATING BASF FARBEN + FASERN AG (DE) 1986-01-28 US disclosed
EP-0145506-A2 Elimination of defects in cysteine-sensitized emulsions E.I. DU PONT DE NEMOURS AND COMPANY (US) 1985-06-19 EP disclosed
US-4522928-A Removal of metal comtaminants from catalysts using buffered oxalic acid EXXON RESEARCH AND ENGINEERING CO. (US) 1985-06-11 US disclosed
JP-S5979793-A HEAT-SENSITIVE RECORDING MATERIAL NIPPON SYNTHETIC CHEM IND CO LTD:THE 1984-05-09 JP disclosed
JP-S5655339-A SEPARATING METHOD OF BIS HYDROXYPHENYL ACETIC ACID AND HYDROXYMANDELIC ACID NIPPON SYNTHETIC CHEM IND CO LTD:THE 1981-05-15 JP disclosed