⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylenediamine SCHEMBL1937042 | 0.92 | ALDH1A1 (0.50) | — | |
| Ethylamine SCHEMBL9791522 | 0.85 | ALDH1A1 (0.44) | — | |
| SCHEMBL11515824 | 0.80 | — | — | |
| SCHEMBL9452590 | 0.79 | ALDH1A1 (0.44) | — | |
| Propylamine SCHEMBL11660443 | 0.78 | KMT2A (0.39) | — | |
| SCHEMBL10462001 | 0.78 | ALDH1A1 (0.60) | — | |
| SCHEMBL9392223 | 0.76 | ALDH1A1 (0.42) | — | |
| SCHEMBL8518522 | 0.75 | — | — | |
| Propylamine SCHEMBL11524260 | 0.75 | KMT2A (0.37) | — | |
| SCHEMBL20630972 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-55089320-A | — | — | None | — | — | JP | disclosed |
| US-10597421-B2 | Protected monomer and method of final deprotection for RNA synthesis | AGILENT TECHNOLOGIES, INC. (US) | 2020-03-24 | — | — | US | disclosed |
| EP-2331558-B1 | PROTECTED MONOMERS AND METHODS OF DEPROTECTION FOR RNA SYNTHESIS | AGILENT TECHNOLOGIES INC (US) | 2018-09-12 | — | — | EP | disclosed |
| US-20180186826-A1 | PROTECTED MONOMER AND METHOD OF FINAL DEPROTECTION FOR RNA SYNTHESIS | AGILENT TECHNOLOGIES, INC. | 2018-07-05 | — | — | US | disclosed |
| US-9896472-B2 | Protected monomer and method of final deprotection for RNA synthesis | AGILENT TECHNOLOGIES, INC. (US) | 2018-02-20 | — | — | US | disclosed |
| US-9273086-B2 | Protected monomer and method of final deprotection for RNA synthesis | AGILENT TECHNOLOGIES, INC. (US) | 2016-03-01 | — | — | US | disclosed |
| US-20160002282-A1 | Protected Monomer and Method of Final Deprotection for RNA Synthesis | AGILENT TECHNOLOGIES, INC. | 2016-01-07 | — | — | US | disclosed |
| US-20120289691-A1 | PROTECTED MONOMER AND METHOD OF FINAL DEPROTECTION FOR RNA SYNTHESIS | AGILENT TECHNOLOGIES, INC. (US) | 2012-11-15 | — | — | US | disclosed |
| US-20120184724-A1 | PROTECTED MONOMERS AND METHODS OF DEPROTECTION FOR RNA SYNTHESIS | AGILENT TECHNOLOGIES, INC. (US) | 2012-07-19 | — | — | US | disclosed |
| US-20100076183-A1 | PROTECTED MONOMER AND METHOD OF FINAL DEPROTECTION FOR RNA SYNTHESIS | AGILENT TECHNOLOGIES, INC. | 2010-03-25 | — | — | US | disclosed |
| US-5605785-A | Annealing processes for nanocrystallization of amorphous dispersions | EASTMAN KODAK COMPANY (US) | 1997-02-25 | — | — | US | disclosed |
| US-4845018-A | BLOCKED DEVELOPMENT INHIBITOR | FUJI PHOTO FILM, CO., LTD. (JP) | 1989-07-04 | — | — | US | disclosed |
| US-4775610-A | TO RELEASE PHOTOGRAPHIC USEFUL AGENT | FUJI PHOTO FILM CO., LTD. (JP) | 1988-10-04 | — | — | US | disclosed |
| US-4734353-A | STORAGE STABILITY; EFFICIEN RELEASE OF USEFUL AGENTS FROM BLOCKED PHOTOGRAPHIC AGENT | FUJI PHOTO FILM CO., LTD. (JP) | 1988-03-29 | — | — | US | disclosed |
| US-4729936-A | WIDE TEMPERATURE RANGE, PYRAZOLE COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 1988-03-08 | — | — | US | disclosed |
| US-4695525-A | HEAT DEVELOPMENT, PYRAZOLONE | FUJI PHOTO FILM CO., LTD. (JP) | 1987-09-22 | — | — | US | disclosed |
| US-4678739-A | RELEASING PHOTOGRAPHICALLY USEFUL COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1987-07-07 | — | — | US | disclosed |
| US-4639408-A | BLOCKED PHOTOGRAPHICALLY USEFUL MATERIAL | FUJI PHOTO FILM CO., LTD. (JP) | 1987-01-27 | — | — | US | disclosed |
| EP-0187343-A2 | Image forming method including heating step | FUJI PHOTO FILM CO., LTD. (JP) | 1986-07-16 | — | — | EP | disclosed |
| JP-S5589320-A | PRODUCTION OF CHELATE RESIN FOR ADSORBING HEAVY METAL | MIYOSHI OIL & FAT CO LTD | 1980-07-05 | — | — | JP | disclosed |