SCHEMBL3360907

SCHEMBL3360907

[C]1Nc2c(ccc3ccccc23)S1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
HSD17B10 Q99714 4/20 0.41
CYP2A6 P11509 3/20 0.41
TSHR P16473 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
HPRT1 P00492 2/20 0.38
HIF1A Q16665 1/20 0.35
CYP1B1 Q16678 1/20 0.35
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA4 P22748 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
HPGD P15428 2/20 0.33
KDM4E B2RXH2 2/20 0.33
ALOX15 P16050 1/20 0.33
HTT P42858 1/20 0.33
CYP1A2 P05177 2/20 0.32
KIF11 P52732 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3360910 1.00 ALDH1A1 (0.41) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL3360445 0.69 ALDH1A1 (0.41) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL3360441 0.69 ALDH1A1 (0.41) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL1801714 0.67 ALDH1A1 (0.42) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL5633813 0.65 ALDH1A1 (0.41) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL1790645 0.65 ALDH1A1 (0.41) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL10448671 0.64 ALDH1A1 (0.39) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL1808446 0.63 ALDH1A1 (0.38) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL26797 0.63 NOX1 (0.55) ALDH1A1HSD17B10CYP2A6TSHRTDP1
Phenanthrene SCHEMBL7643 0.62 CYP2A6 (1.00) ALDH1A1HSD17B10CYP2A6TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0568993-B1 Chemical amplification resist composition KYOWA HAKKO KOGYO KK (JP) 1998-08-12 EP claimed
US-5527659-A PHOTOSENSITIVITY KYOWA HAKKO KOGYO CO., LTD. (JP) 1996-06-18 US claimed
EP-1267338-B1 Optical recording medium, optical recording method and optical recording device RICOH KK (JP) 2010-04-07 EP disclosed
US-20090135706-A1 Optical recording medium, and optical recording method and optical recording apparatus thereof KYOWA HAKKO CHEMICAL CO., LTD. (JP) 2009-05-28 US disclosed
US-7223521-B2 Squarylium-metal chelate compounds and optical recording media RICOH COMPANY, LTD. (JP) 2007-05-29 US disclosed
US-6936323-B2 Optical recording medium, and method and device using the same RICOH COMPANY, LTD. (JP) 2005-08-30 US disclosed
US-20040265645-A1 Optical recording medium, and method and device using the same RICOH COMPANY, LTD. (JP) 2004-12-30 US disclosed
US-20040202098-A1 Squarylium-metal chelate compounds and optical recording media RICOH COMPANY, LTD. (JP) 2004-10-14 US disclosed
US-6794005-B2 FORMAZAN METAL CHELATE; SQUARYLIUM METAL CHELATE; PHTHALOCYANINE DYE OR A PENTAMETHINE CYANINE DYE RICOH COMPANY, LTD. (JP) 2004-09-21 US disclosed
US-6737143-B2 HAVING RELIABILITY, HIGH REFLECTIVITY AND LOW JITTER RICOH COMPANY LTD. (JP) 2004-05-18 US disclosed
US-20030206514-A1 Optical recording medium, optical recording method and optical recording device KYOWA YUKA CO., LTD. (JP) 2003-11-06 US disclosed
US-20030157291-A1 Optical recording medium, optical recording method and optical recording device RICOH COMPANY, LTD. 2003-08-21 US disclosed
EP-1335357-A1 Optical recording medium, optical recording method and optical recording device Ricoh Company, Ltd. (JP) 2003-08-13 EP disclosed
EP-1267338-A2 Optical recording medium, optical recording method and optical recording device Ricoh Company, Ltd. (JP) 2002-12-18 EP disclosed
EP-0568993-B1 Chemical amplification resist composition KYOWA HAKKO KOGYO KK (JP) 1998-08-12 EP disclosed
US-5527659-A PHOTOSENSITIVITY KYOWA HAKKO KOGYO CO., LTD. (JP) 1996-06-18 US disclosed
EP-0568993-A2 Chemical amplification resist composition KYOWA HAKKO KOGYO CO., LTD. (JP) 1993-11-10 EP disclosed