SCHEMBL3360445

SCHEMBL3360445

[C]1Nc2ccc3ccccc3c2S1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
HSD17B10 Q99714 5/20 0.41
TDP1 Q9NUW8 3/20 0.41
CYP2A6 P11509 3/20 0.41
TSHR P16473 2/20 0.41
MAPT P10636 3/20 0.41
RAB9A P51151 2/20 0.41
MEN1 O00255 1/20 0.41
NPC1 O15118 1/20 0.41
GAA P10253 1/20 0.41
KMT2A Q03164 1/20 0.41
NOX1 Q9Y5S8 1/20 0.41
HIF1A Q16665 1/20 0.40
CYP1B1 Q16678 1/20 0.40
HPRT1 P00492 2/20 0.38
HTR1B P28222 1/20 0.33
CYP1A2 P05177 3/20 0.32
KIF11 P52732 1/20 0.32
PARP1 P09874 1/20 0.32
PRKCI P41743 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3360441 1.00 ALDH1A1 (0.41) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL30874982 0.69 MAPT (0.65) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL3360910 0.69 ALDH1A1 (0.41) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL3360907 0.69 ALDH1A1 (0.41) ALDH1A1HSD17B10TDP1CYP2A6TSHR
Hydrochloric Acid SCHEMBL11292811 0.65 ALDH1A1 (0.41) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL3360447 0.65 CYP2A6 (0.41) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL13873060 0.64 TDP1 (0.54) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL1393346 0.63 NOX1 (0.69) ALDH1A1HSD17B10TDP1CYP2A6TSHR
Phenanthrene SCHEMBL30932938 0.62 CYP2A6 (1.00) ALDH1A1HSD17B10TDP1CYP2A6TSHR
Phenanthrene SCHEMBL7643 0.62 CYP2A6 (1.00) ALDH1A1HSD17B10TDP1CYP2A6TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0568993-B1 Chemical amplification resist composition KYOWA HAKKO KOGYO KK (JP) 1998-08-12 EP claimed
US-5527659-A PHOTOSENSITIVITY KYOWA HAKKO KOGYO CO., LTD. (JP) 1996-06-18 US claimed
EP-0568993-A2 Chemical amplification resist composition KYOWA HAKKO KOGYO CO., LTD. (JP) 1993-11-10 EP claimed
EP-1267338-B1 Optical recording medium, optical recording method and optical recording device RICOH KK (JP) 2010-04-07 EP disclosed
EP-1449890-B1 Squarylium-metal chelate compounds and optical recording media RICOH KK (JP) 2007-09-19 EP disclosed
US-7223521-B2 Squarylium-metal chelate compounds and optical recording media RICOH COMPANY, LTD. (JP) 2007-05-29 US disclosed
US-6936323-B2 Optical recording medium, and method and device using the same RICOH COMPANY, LTD. (JP) 2005-08-30 US disclosed
US-20040265645-A1 Optical recording medium, and method and device using the same RICOH COMPANY, LTD. (JP) 2004-12-30 US disclosed
US-20040202098-A1 Squarylium-metal chelate compounds and optical recording media RICOH COMPANY, LTD. (JP) 2004-10-14 US disclosed
US-6794005-B2 FORMAZAN METAL CHELATE; SQUARYLIUM METAL CHELATE; PHTHALOCYANINE DYE OR A PENTAMETHINE CYANINE DYE RICOH COMPANY, LTD. (JP) 2004-09-21 US disclosed
EP-1449890-A1 Squarylium-metal chelate compounds and optical recording media Ricoh Company, Ltd. (JP) 2004-08-25 EP disclosed
US-6737143-B2 HAVING RELIABILITY, HIGH REFLECTIVITY AND LOW JITTER RICOH COMPANY LTD. (JP) 2004-05-18 US disclosed
US-20030206514-A1 Optical recording medium, optical recording method and optical recording device KYOWA YUKA CO., LTD. (JP) 2003-11-06 US disclosed
US-20030157291-A1 Optical recording medium, optical recording method and optical recording device RICOH COMPANY, LTD. 2003-08-21 US disclosed
EP-1335357-A1 Optical recording medium, optical recording method and optical recording device Ricoh Company, Ltd. (JP) 2003-08-13 EP disclosed
EP-1267338-A2 Optical recording medium, optical recording method and optical recording device Ricoh Company, Ltd. (JP) 2002-12-18 EP disclosed
EP-0568993-B1 Chemical amplification resist composition KYOWA HAKKO KOGYO KK (JP) 1998-08-12 EP disclosed
US-5527659-A PHOTOSENSITIVITY KYOWA HAKKO KOGYO CO., LTD. (JP) 1996-06-18 US disclosed
EP-0568993-A2 Chemical amplification resist composition KYOWA HAKKO KOGYO CO., LTD. (JP) 1993-11-10 EP disclosed