⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL336093 | 1.00 | — | — | |
| SCHEMBL29013737 | 0.79 | TRPA1 (0.33) | — | |
| SCHEMBL6902033 | 0.74 | — | — | |
| SCHEMBL6902032 | 0.74 | — | — | |
| SCHEMBL7767310 | 0.73 | — | — | |
| SCHEMBL5853861 | 0.73 | — | — | |
| SCHEMBL15209915 | 0.73 | — | — | |
| SCHEMBL14777232 | 0.73 | — | — | |
| SCHEMBL445213 | 0.73 | — | — | |
| SCHEMBL445212 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117417636-A | Washable antibacterial antiviral composite material and preparation method and application thereof | 江苏集萃先进纤维材料研究所有限公司 | 2024-01-19 | — | — | CN | claimed |
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | claimed |
| CN-117417636-A | Washable antibacterial antiviral composite material and preparation method and application thereof | 江苏集萃先进纤维材料研究所有限公司 | 2024-01-19 | — | — | CN | disclosed |
| US-20140050860-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-02-20 | — | — | US | disclosed |
| US-8618183-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-31 | — | — | US | disclosed |
| US-20120328796-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-27 | — | — | US | disclosed |
| US-8268411-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-18 | — | — | US | disclosed |
| US-8097932-B2 | Ultra low κ plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-01-17 | — | — | US | disclosed |
| US-7674521-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-03-09 | — | — | US | disclosed |
| US-20090297729-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-12-03 | — | — | US | disclosed |
| US-20090146265-A1 | ULTRA LOW k PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION PROCESSES USING A SINGLE BIFUNCTIONAL PRECURSOR CONTAINING BOTH A SiCOH MATRIX FUNCTIONALITY AND ORGANIC POROGEN FUNCTIONALITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-11 | — | — | US | disclosed |
| WO-2004106394-A1 | COPOLYMERS OF ETHYLENE AND/OR α-OLEFINS AND VICINALLY DISUBSTITUTED OLEFINS | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2004-12-09 | — | — | WO | disclosed |
| US-20040242814-A1 | COPOLYMERS OF ETHYLENE AND/OR ALPHA-OLEFINS AND VICINALLY DISUBSTITUTED OLEFINS | EXXONMOBIL CHEMICAL PATENTS INC. | 2004-12-02 | — | — | US | disclosed |
| US-5158854-A | Ladder polymers having hydrophilic groups | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1992-10-27 | — | — | US | disclosed |
| EP-0232167-B1 | PHOTOSENSITIVE AND HIGH ENERGY BEAM SENSITIVE RESIN COMPOSITION CONTAINING SUBSTITUTED POLYSILOXANE | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1988-12-28 | — | — | EP | disclosed |
| EP-0232167-A2 | Photosensitive and high energy beam sensitive resin composition containing substituted polysiloxane | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1987-08-12 | — | — | EP | disclosed |
| US-4454243-A | REACTING LITHIUM AND AN ALKENE USING A TRANSITION OR ALKALI METAL COMPLEX | STUDIENGESELLSCHAFT KOHLE MBH (DE) | 1984-06-12 | — | — | US | disclosed |
| EP-0015541-B1 | PROCESS FOR THE PREPARATION OF ORGANOLITHIUM COMPOUNDS BESIDES LITHIUM HYDRIDE; CATALYSTS | Studiengesellschaft Kohle mbH (DE) | 1984-03-07 | — | — | EP | disclosed |
| US-4354982-A | Production of organolithium compounds and lithium hydride | STUDIENGESELLSCHAFT KOHLE M.B.H. (DE) | 1982-10-19 | — | — | US | disclosed |
| EP-0015541-A2 | Process for the preparation of organolithium compounds besides lithium hydride; catalysts | Studiengesellschaft Kohle mbH (DE) | 1980-09-17 | — | — | EP | disclosed |