SCHEMBL445212

SCHEMBL445212

CC/C=C/[Si](C)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL445213 1.00
SCHEMBL7767310 0.81
SCHEMBL15209915 0.81
SCHEMBL8402907 0.80 TRPA1 (0.38)
SCHEMBL8402906 0.80 TRPA1 (0.38)
SCHEMBL3483449 0.78
SCHEMBL3483447 0.78
SCHEMBL4355502 0.77
SCHEMBL4355504 0.77
SCHEMBL336092 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2276793-B1 SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS ESSILOR INT (FR) 2012-08-01 EP claimed
US-8063237-B2 Sulfur modified silanes for the elaboration of high refractive index materials ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2011-11-22 US claimed
US-20110077341-A1 SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS ESSILOR INTERNATIONAL (FR) 2011-03-31 US claimed
EP-2276793-A1 SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS Essilor International (Compagnie Générale d'Optique) (FR) 2011-01-26 EP claimed
WO-2009138853-A1 SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS ESSILOR INTERNATIONAL (FR) 2009-11-19 WO claimed
WO-2022129201-A1 PLATELET-LIKE MATTING AGENT FOR POWDER COATING AND POWDER COATINGS ECKART GMBH (DE) 2022-06-23 WO disclosed
CN-107109130-B Polysiloxanes as anti-adhesion and anti-fouling additives, method for their production and use 毕克化学有限公司 2019-12-31 CN disclosed
EP-3221409-B1 POLYSILOXANES AS ANTI-ADHESIVE AND DIRT-REPELLANT ADDITIVES, METHOD FOR THEIR PREPARATION AND THEIR USE BYK CHEMIE GMBH (DE) 2018-11-07 EP disclosed
US-9938432-B2 Polysiloxanes as anti-adhesive and dirt-repellant additives, method for the production and use thereof BYK Chemie, GmbH (DE) 2018-04-10 US disclosed
EP-2698403-B1 Surface modified pearlescent pigments and their use in powder coatings ECKART GMBH (DE) 2018-01-03 EP disclosed
EP-3221409-A1 POLYSILOXANES AS ANTI-ADHESIVE AND DIRT-REPELLANT ADDITIVES, METHOD FOR THE PRODUCTION AND USE THEREOF BYK-Chemie GmbH (DE) 2017-09-27 EP disclosed
US-20170247572-A1 POLYSILOXANES AS ANTI-ADHESIVE AND DIRT-REPELLANT ADDITIVES, METHOD FOR THE PRODUCTION AND USE THEREOF BYK-CHEMIE GMBH (DE) 2017-08-31 US disclosed
EP-0857727-B1 Polymerization of vinyl monomers from silanes and siloxanes DOW CORNING (US) 2003-04-02 EP disclosed
US-6156468-A Blocking layer with light scattering particles having rough surface XEROX CORPORATION (US) 2000-12-05 US disclosed
EP-1020403-A1 Haloalkyl silane containing zeolite powder Degussa-Hüls Aktiengesellschaft (DE) 2000-07-19 EP disclosed
US-5958638-A COMPRISING UNDERCOAT LAYER ON CONDUCTIVE SUBSTRATE AND PHOTOSENSITIVE LAYER FORMED ON UNDERCOAT LAYER; UNIFORM CHARGEABILITY TO PREDETERMINED POTENTIAL, LOW RESIDUAL POTENTIAL, STABILITY AFTER REPEATED USE SHARP KABUSHIKI KAISHA (JP) 1999-09-28 US disclosed
EP-0887711-A1 Electrophotographic photoconductor and method of producing same SHARP KABUSHIKI KAISHA (JP) 1998-12-30 EP disclosed
EP-0857727-A2 Polymerization of vinyl monomers from silanes and siloxanes DOW CORNING CORPORATION (US) 1998-08-12 EP disclosed
US-5789503-A Polymerization of vinyl monomers from silanes and siloxanes DOW CORNING CORPORATION (US) 1998-08-04 US disclosed
US-5708115-A OZONIDE GROUPS, FREE RADICAL CATALYSTS DOW CORNING CORPORATION (US) 1998-01-13 US disclosed