Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 3/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10300866 | 0.84 | KDM4E (0.35) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL15492228 | 0.83 | KDM4E (0.35) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL3364668 | 0.82 | KDM4E (0.37) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL3363142 | 0.80 | KDM4E (0.35) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL4952386 | 0.79 | KDM4E (0.36) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL6423573 | 0.78 | KDM4E (0.38) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL24355008 | 0.78 | KDM4E (0.34) | KDM4EALDH1A1POLBALOX15TDP1 | |
| SCHEMBL6330510 | 0.78 | KDM4E (0.35) | KDM4EALDH1A1 | |
| SCHEMBL13743053 | 0.78 | KDM4E (0.35) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL12577685 | 0.77 | KDM4E (0.41) | KDM4EALDH1A1MEN1KMT2ACYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8678203-B2 | Polynorbornene pervaporation membrane films, preparation and use thereof | PROMERUS, LLC (US) | 2014-03-25 | — | — | US | disclosed |
| US-20130292872-A1 | Polynorbornene Pervaporation Membrane Films, Preparation and Use Thereof | PROMERUS, LLC | 2013-11-07 | — | — | US | disclosed |
| US-8470944-B2 | Polynorbornene pervaporation membrane films, preparation and use thereof | PROMERUS, LLC (US) | 2013-06-25 | — | — | US | disclosed |
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-7714079-B2 | Ultra-large scale integrated (ULSI); film stack; hydrosilation | INTERNATIONAL BUSINESS MACHINES CORPORAITON (US) | 2010-05-11 | — | — | US | disclosed |
| US-20080063880-A1 | Ultra-large scale integrated (ULSI); film stack; hydrosilation | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-03-13 | — | — | US | disclosed |
| US-7306853-B2 | Ultra-large scale integrated interconnect structures; forming via and/or line patterns in a curable caged polysilsesquioxane, curing and filling the patterns with a conductor; combines the functions of a photoresist and a conventional low-k dielectric into a single material | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-12-11 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6623907-B2 | Chemical amplified photoresist | JSR CORPORATION (JP) | 2003-09-23 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |