SCHEMBL3364668

SCHEMBL3364668

COC(C)(CC1CC2C=CC1C2)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.37
ALDH1A1 P00352 2/20 0.37
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
ATM Q13315 1/20 0.33
HTT P42858 1/20 0.31
TSHR P16473 1/20 0.31
POLB P06746 1/20 0.30
ALOX15 P16050 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3362486 0.82 KDM4E (0.38) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL3364410 0.81 KDM4E (0.34) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL12577685 0.80 KDM4E (0.41) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL13324800 0.80 KDM4E (0.41) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL14707418 0.79 KDM4E (0.43) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL3367438 0.79 KDM4E (0.33) KDM4EALDH1A1POLBALOX15
SCHEMBL118602 0.77 KDM4E (0.39) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL13487232 0.75 KDM4E (0.40) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL15466780 0.75 KDM4E (0.46) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL13486936 0.75 KDM4E (0.42) KDM4EALDH1A1MEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-6800414-B2 FLUOROPOLYMER JSR CORPORATION (JP) 2004-10-05 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed