⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6659170 | 0.82 | — | — | |
| SCHEMBL1109664 | 0.81 | — | — | |
| Ammonia Solution, Strong SCHEMBL734600 | 0.79 | — | — | |
| Ethane SCHEMBL19100907 | 0.77 | — | — | |
| SCHEMBL48138 | 0.76 | LMNA (0.32) | — | |
| SCHEMBL28449644 | 0.75 | — | — | |
| SCHEMBL11743626 | 0.72 | — | — | |
| SCHEMBL342532 | 0.72 | — | — | |
| SCHEMBL5081342 | 0.71 | — | — | |
| SCHEMBL56081 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | claimed |
| WO-2004085565-A1 | SINGLE COMPONENT, CHEMICALLY CURING WARM APPLIED SEALANT FOR DURABLE INSULATING GLAZING UNITS | LE JOINT FRANCAIS (FR) | 2004-10-07 | — | — | WO | claimed |
| EP-1462500-A1 | Single component, chemically curing warm applied sealant for durable insulating glazing units | LE JOINT FRANCAIS (FR) | 2004-09-29 | — | — | EP | claimed |
| US-12606576-B2 | Method for producing nitrogen-containing organoxysilane compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-21 | — | — | US | disclosed |
| US-20240425531-A1 | METHOD FOR PRODUCING CYCLIC SILAZANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-12-26 | — | — | US | disclosed |
| CN-113383048-B | Antireflection film with pressure-sensitive adhesive layer, self-luminous display device, and method for manufacturing same | 日东电工株式会社 | 2024-10-22 | — | — | CN | disclosed |
| EP-4410797-A1 | METHOD FOR PRODUCING CYCLIC SILAZANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-08-07 | — | — | EP | disclosed |
| CN-118043332-A | Method for producing cyclic silazane compound | 信越化学工业株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-113286702-B | Pressure-sensitive adhesive sheet | 日东电工株式会社 | 2024-03-22 | — | — | CN | disclosed |
| CN-117518328-A | Polarizing film with adhesive layer | 日东电工株式会社 | 2024-02-06 | — | — | CN | disclosed |
| EP-4006042-B1 | METHOD FOR PRODUCING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND | SHINETSU CHEMICAL CO (JP) | 2024-01-31 | — | — | EP | disclosed |
| WO-2001005203-A1 | UNDERFILLING MATERIAL FOR SEMICONDUCTOR PACKAGE | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 2001-01-18 | — | — | WO | disclosed |
| EP-0923924-A2 | Dental adhesive kit | SUN MEDICAL CO., LTD. (JP) | 1999-06-23 | — | — | EP | disclosed |
| US-5534579-A | PAINTS, ACRYLIC MONOMER CONTAINING PIPERIDINE GROUP, CARBOXYLIC ACID CONTAINING EMULSIFIER, REACTION BETWEEN EMULSIFIER AND EMULSION POLYMER | NIPPON SHOKUBAI CO., LTD. (JP) | 1996-07-09 | — | — | US | disclosed |
| EP-0567654-A1 | HIGHLY WEATHER-RESISTANT ONE-PACK CROSS-LINKING EMULSION | NIPPON SHOKUBAI CO., LTD. (JP) | 1993-11-03 | — | — | EP | disclosed |
| EP-0376293-A2 | Curable composition | NIPPON PAINT CO., LTD. (JP) | 1990-07-04 | — | — | EP | disclosed |
| EP-0154980-B1 | NEGATIVE WORKING LIGHT-SENSITIVE LITHOGRAPHIC PLATE REQUIRING NO DAMPENING SOLUTION AND PLATE MAKING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 1990-05-30 | — | — | EP | disclosed |
| US-4927951-A | (METH)ACRYLAMIDE GROUP CONTAINING SILOXANES | TOSHIBA SILICONE CO., LTD. (JP) | 1990-05-22 | — | — | US | disclosed |
| US-4642283-A | USING A BASIC COMPOUND IN THE DEVELOPER TO EFFECT COUPLING OF AN O-QUINONEDIAZIDE COMPOUND IN THE NONEXPOSED AREA | FUJI PHOTO FILM CO., LTD. (JP) | 1987-02-10 | — | — | US | disclosed |
| EP-0154980-A1 | Negative working light-sensitive lithographic plate requiring no dampening solution and plate making process | FUJI PHOTO FILM CO., LTD. (JP) | 1985-09-18 | — | — | EP | disclosed |