SCHEMBL342532

SCHEMBL342532

CCCNC(CC)[Si](OC)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL48138 0.91 LMNA (0.32)
SCHEMBL128731 0.87 ALDH1A1 (0.32)
SCHEMBL6660600 0.85 ALDH1A1 (0.36)
SCHEMBL29249261 0.84 EPHX1 (0.37)
SCHEMBL9551513 0.84 EPHX1 (0.37)
SCHEMBL14697350 0.84 EPHX1 (0.37)
SCHEMBL2145475 0.83
SCHEMBL361861 0.83
Hydrochloric Acid SCHEMBL1231795 0.82 EPHX1 (0.36)
Ammonia Solution, Strong SCHEMBL1779682 0.82 EPHX1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2242720-B1 DUAL TREATED SILICA, METHODS OF MAKING DUAL TREATED SILICA, AND INKJET RECORDING MATERIALS HEWLETT PACKARD DEVELOPMENT CO LP (US) 2016-12-28 EP claimed
US-7906188-B2 Porous silica coated inkjet recording material HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2011-03-15 US claimed
US-20100297419-A1 DUAL TREATED SILICA, METHODS OF MAKING DUAL TREATED SILICA, AND INKJET RECORDING MATERIALS HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2010-11-25 US claimed
EP-2242720-A1 DUAL TREATED SILICA, METHODS OF MAKING DUAL TREATED SILICA, AND INKJET RECORDING MATERIALS Hewlett-Packard Development Company, L.P. (US) 2010-10-27 EP claimed
WO-2009094023-A1 DUAL TREATED SILICA, METHODS OF MAKING DUAL TREATED SILICA, AND INKJET RECORDING MATERIALS HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2009-07-30 WO claimed
US-20060062941-A1 Porous silica coated inkjet recording material HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2006-03-23 US claimed
EP-2964381-B2 CATALYST FOR THE CROSS-LINKING OF SILICON RUBBERS NITROCHEMIE GMBH (DE) 2026-05-27 EP disclosed
US-20260139102-A1 EMISSION-FREE SILICONE RUBBER COMPOUNDS NITROCHEMIE ASCHAU GMBH (DE) 2026-05-21 US disclosed
EP-4602106-A1 EMISSION FREE SILICONE RUBBER COMPOUNDS Nitrochemie Aschau GmbH (DE) 2025-08-20 EP disclosed
EP-3875541-B1 COMPOSITION AND METHOD FOR PRODUCING SILICONE MASSES AND USE THEREOF POLYU GMBH (DE) 2024-08-14 EP disclosed
WO-2024079186-A1 EMISSION FREE SILICONE RUBBER COMPOUNDS NITROCHEMIE ASCHAU GMBH (DE) 2024-04-18 WO disclosed
US-20230097205-A1 COMPOSITION AND METHOD FOR PRODUCING SILICONE COMPOUNDS, AND USE THEREOF POLYU GMBH (DE) 2023-03-30 US disclosed
CN-109790190-B Curing agent for silicone rubber material 硝基化学阿绍有限公司 2022-08-02 CN disclosed
WO-2009094023-A1 DUAL TREATED SILICA, METHODS OF MAKING DUAL TREATED SILICA, AND INKJET RECORDING MATERIALS HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2009-07-30 WO disclosed
WO-2009027103-A2 A HARDENER FOR SILICONE RUBBER MATERIALS NITROCHEMIE ASCHAU GMBH (DE) 2009-03-05 WO disclosed
EP-2031017-A1 Hardener for silicone rubber mass Nitrochemie Aschau GmbH (DE) 2009-03-04 EP disclosed
EP-2030976-A1 Hardener for silicone rubber mass Nitrochemie Aschau GmbH (DE) 2009-03-04 EP disclosed
WO-2007050462-A2 METHOD OF TREATING SILICA AND INKJET RECORDING MATERIAL HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2007-05-03 WO disclosed
US-20060062941-A1 Porous silica coated inkjet recording material HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2006-03-23 US disclosed
US-4418195-A CORROSION INHIBITORS, MICROBIOCIDES PETROLITE CORPORATION (US) 1983-11-29 US disclosed