SCHEMBL3362839

SCHEMBL3362839

CCCC(CC)C(C)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24967848 1.00
SCHEMBL20663119 1.00
SCHEMBL5359917 0.88 METAP1 (0.44)
SCHEMBL19660273 0.88 METAP1 (0.44)
SCHEMBL20492541 0.83 OPRM1 (0.46)
SCHEMBL19038295 0.82 SLC1A3 (0.32)
SCHEMBL19290483 0.81 METAP1 (0.37)
SCHEMBL6692572 0.81 OPRM1 (0.56)
SCHEMBL3818116 0.81
SCHEMBL19113968 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6833468-B2 Reacting an optically active imine with a compound that is a hemiacetal of a perfluoroalkylaldehyde or a hydrate of a perfluoroalkylaldehyde to obtain a condensate, hydrolyzing CENTRAL GLASS COMPANY, LIMITED (JP) 2004-12-21 US claimed
EP-3820846-B1 COMPOSITION FOR INHIBITING MONOMER POLYMERIZATION COMPRISING A NITROXIDE INHIBITOR, A QUINONE METHIDE RETARDER AND AN AMINE STABILIZER ECOLAB USA INC (US) 2024-01-03 EP disclosed
US-11626354-B2 Method of manufacturing redistribution substrate SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-04-11 US disclosed
US-20220415771-A1 SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2022-12-29 US disclosed
US-20220278121-A1 SEMICONDUCTOR MEMORY DEVICES SAMSUNG ELECTRONICS CO LTD (KR) 2022-09-01 US disclosed
US-11355509-B2 Semiconductor memory devices SAMSUNG ELECTRONICS CO., LTD. 2022-06-07 US disclosed
US-11180578-B2 Polymerization inhibitor and retarder compositions with amine stabilizer ECOLAB USA INC. (US) 2021-11-23 US disclosed
US-20210296163-A1 METHOD OF MANUFACTURING REDISTRIBUTION SUBSTRATE SAMSUNG ELECTRONICS CO LTD (KR) 2021-09-23 US disclosed
EP-3820846-A1 COMPOSITION FOR INHIBITING MONOMER POLYMERIZATION COMPRISING A NITROXIDE INHIBITOR, A QUINONE METHIDE RETARDER AND AN AMINE STABILIZER Ecolab USA, Inc. (US) 2021-05-19 EP disclosed
CN-112533902-A Compositions comprising nitroxide inhibitors, quinone methide blockers and amine stabilizers to inhibit polymerization of monomers 埃科莱布美国股份有限公司 2021-03-19 CN disclosed
US-6833468-B2 Reacting an optically active imine with a compound that is a hemiacetal of a perfluoroalkylaldehyde or a hydrate of a perfluoroalkylaldehyde to obtain a condensate, hydrolyzing CENTRAL GLASS COMPANY, LIMITED (JP) 2004-12-21 US disclosed
EP-1484191-A1 REWRITABLE OPTICAL INFORMATION RECORDING MEDIUM AND RECORDING/REPRODUCING METHOD, RECORDING/REPRODUCING DEVICE Sony Corporation (JP) 2004-12-08 EP disclosed
US-6642409-B2 Reacting an imine with a hemiacetal; hydrolysis under acid conditions CENTRAL GLASS COMPANY, LIMITED (JP) 2003-11-04 US disclosed
US-6639100-B2 Baeyer-Villiger oxidation of an optically active 4,4,4-tri-fluoro-3-hydroxy-1-aryl-1-butanone; purification by precipitation and removing racemic crystals; agriculture; drugs; ferroelectric liquid crystals; chemical intermediates CENTRAL GLASS COMPANY, LIMITED (JP) 2003-10-28 US disclosed
US-20030100767-A1 Reacting an optically active imine with a compound that is a hemiacetal of a perfluoroalkylaldehyde or a hydrate of a perfluoroalkylaldehyde to obtain a condensate, hydrolyzing CENTRAL GLASS COMPANY, LIMITED 2003-05-29 US disclosed
US-20030088095-A1 Reacting an optically active imine with a hemiacetal of a perfluoroalkylaldehyde or a hydrate; hydrolyzing the condensate under an acid condition. CENTRAL GLASS COMPANY, LIMITED 2003-05-08 US disclosed
US-20020016511-A1 Reacting an imine with a hemiacetal; hydrolysis under acid conditions CENTRAL GLASS COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-0507145-B1 Alkaline black-and-white developer for silver halide photographic material EASTMAN KODAK CO (US) 2000-06-21 EP disclosed
US-5478706-A Improved sensitivity, silver blackness of image MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1995-12-26 US disclosed
EP-0507145-A1 Alkaline black-and-white developer for silver halide photographic material MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-10-07 EP disclosed