SCHEMBL3363653

SCHEMBL3363653

CCOC(=O)OC1CC[S+](c2cccc3ccccc23)C1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.34
HPGD P15428 1/20 0.34
NR1D1 P20393 1/20 0.31
KDM4E B2RXH2 2/20 0.31
APOBEC3A P31941 1/20 0.31
APOBEC3G Q9HC16 1/20 0.31
PKM P14618 1/20 0.31
POLB P06746 1/20 0.31
CDC25B P30305 2/20 0.31
CDC25A P30304 1/20 0.31
CDC25C P30307 1/20 0.31
CCR8 P51685 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3367266 0.93
SCHEMBL3368083 0.92
Trifluoromethanesulfonic Acid SCHEMBL2745117 0.91 ALDH1A1 (0.38) ALDH1A1HPGDNR1D1KDM4EAPOBEC3A
SCHEMBL3363116 0.91 RORC (0.32)
SCHEMBL3366586 0.89
SCHEMBL3367881 0.88 KCNJ11 (0.32)
SCHEMBL6393293 0.88
SCHEMBL6566380 0.85 ALDH1A1 (0.45) ALDH1A1HPGDNR1D1KDM4EAPOBEC3A
SCHEMBL6399791 0.85
SCHEMBL6397891 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-6800414-B2 FLUOROPOLYMER JSR CORPORATION (JP) 2004-10-05 US disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed