⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL2745535 | 0.91 | HTR7 (0.31) | — | |
| SCHEMBL6399791 | 0.89 | — | — | |
| SCHEMBL3363116 | 0.86 | RORC (0.32) | — | |
| SCHEMBL6391372 | 0.85 | — | — | |
| SCHEMBL6393293 | 0.84 | — | — | |
| SCHEMBL3366135 | 0.84 | — | — | |
| SCHEMBL3367881 | 0.83 | KCNJ11 (0.32) | — | |
| SCHEMBL6397891 | 0.81 | — | — | |
| SCHEMBL1533147 | 0.81 | GAA (0.30) | — | |
| SCHEMBL6392635 | 0.81 | CA1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |