Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7050455 | 0.83 | KDM4E (0.33) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL5856382 | 0.81 | KDM4E (0.33) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL4608572 | 0.81 | KDM4E (0.38) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL1088788 | 0.77 | NPC1 (0.36) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL3364098 | 0.77 | KDM4E (0.32) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL4666821 | 0.74 | KDM4E (0.33) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL12729995 | 0.74 | KDM4E (0.33) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL3063779 | 0.72 | KDM4E (0.30) | KDM4ELMNA | |
| SCHEMBL23747121 | 0.72 | KDM4E (0.36) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL13370548 | 0.72 | KDM4E (0.36) | KDM4ELMNAALDH1A1GAATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |