Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | DGKA | P23743 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | RAD52 | P43351 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | FAAH | O00519 | 1/20 | 0.41 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.40 |
| ▸ | HTR2C | P28335 | 1/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.39 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.39 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5434714 | 0.94 | NAAA (0.57) | NAAAALDH1A1DGKATSHRRAD52 | |
| SCHEMBL5429607 | 0.92 | NAAA (0.60) | NAAAALDH1A1DGKATSHRRAD52 | |
| SCHEMBL5443448 | 0.92 | NAAA (0.60) | NAAAALDH1A1DGKATSHRRAD52 | |
| SCHEMBL5433717 | 0.92 | NAAA (0.60) | NAAAALDH1A1DGKATSHRRAD52 | |
| SCHEMBL5437837 | 0.92 | NAAA (0.60) | NAAAALDH1A1DGKATSHRRAD52 | |
| SCHEMBL5447353 | 0.92 | NAAA (0.60) | NAAAALDH1A1DGKATSHRRAD52 | |
| SCHEMBL5447312 | 0.92 | NAAA (0.60) | NAAAALDH1A1DGKATSHRRAD52 | |
| SCHEMBL5434663 | 0.92 | NAAA (0.60) | NAAAALDH1A1DGKATSHRRAD52 | |
| SCHEMBL3364076 | 0.88 | NAAA (0.38) | NAAAALDH1A1DGKATSHRTDP1 | |
| SCHEMBL4908644 | 0.79 | ALDH1A1 (0.52) | NAAAALDH1A1ATMDGKATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-110709774-B | Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2023-12-08 | — | — | CN | disclosed |
| WO-2023210623-A1 | HALOALKYL SULFONE ANILIDE COMPOUND AND HERBICIDE CONTAINING SAME | 株式会社エス・ディー・エス バイオテック | 2023-11-02 | — | — | WO | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20200264511-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3693793-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200241419-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111183395-A | Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-05-19 | — | — | CN | disclosed |
| CN-110709774-A | Material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-01-17 | — | — | CN | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| US-5985531-A | PHOTOGRAPHIC FILMS WITH DEVELOPMENT INHIBITORS | FUJI PHOTO FILM CO., LTD. (JP) | 1999-11-16 | — | — | US | disclosed |
| US-5942381-A | DEVELOPMENT INHIBITOR RELEASING COUPLER; MAGENTA | EASTMAN KODAK COMPANY (US) | 1999-08-24 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0884639-A1 | Photographic element and process employing active, stable benzotriazole-releasing DIR couplers | EASTMAN KODAK COMPANY (US) | 1998-12-16 | — | — | EP | disclosed |
| EP-0530681-B1 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO LTD (JP) | 1998-11-18 | — | — | EP | disclosed |
| US-5541050-A | SENSITIZERS, DEVELOPMENT INHIBITOR GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-30 | — | — | US | disclosed |
| US-5422231-A | Exposure function | FUJI PHOTO FILM CO., LTD. (JP) | 1995-06-06 | — | — | US | disclosed |
| EP-0530681-A1 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1993-03-10 | — | — | EP | disclosed |
| US-4214093-A | PROTEOLYTIC ENZYME INHIBITORS | TORII & CO., LTD. (JP) | 1980-07-22 | — | — | US | disclosed |