⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL434423 | 1.00 | — | — | |
| Lithium Ion SCHEMBL29539089 | 0.71 | — | — | |
| Hydrogen Sulfide SCHEMBL27970721 | 0.71 | — | — | |
| SCHEMBL11451354 | 0.71 | — | — | |
| SCHEMBL49349 | 0.71 | — | — | |
| Charcoal, Activated SCHEMBL8422005 | 0.71 | — | — | |
| SCHEMBL23461972 | 0.00 | — | — | |
| Methane SCHEMBL23795058 | 0.00 | — | — | |
| SCHEMBL25437340 | 0.00 | — | — | |
| Phosphine SCHEMBL25436453 | 0.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 20451 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4749718-A1 | ELECTROCHEMICAL CATALYST INCLUDING NANO-SILICATE COMPOSITE, MANUFACTURING METHOD THEREFOR, AND ELECTRODE COMPOSITION AND ELECTRODE INCLUDING SAME | G.I.Tech Co., Ltd. (KR) | 2026-05-27 | — | — | EP | claimed |
| US-12636877-B2 | Adhesive printing form attachment layer, method for its manufacture, and printing form attachment cylinder comprising the same | TESA SE (DE) | 2026-05-26 | — | — | US | claimed |
| US-12640364-B2 | High capacity, long cycle life battery anode materials, compositions and methods | DYNAMIC MATERIAL SYSTEMS LLC (US) | 2026-05-26 | — | — | US | claimed |
| CN-122080533-A | Halogen-free flame-retardant outer mold material for salt spray-resistant test data line plug and preparation method thereof | — | 2026-05-26 | — | — | CN | claimed |
| US-20260142194-A1 | ELECTROCHEMICAL CATALYST INCLUDING NANO-SILICATE COMPOSITE, MANUFACTURING METHOD THEREFOR, AND ELECTRODE COMPOSITION AND ELECTRODE INCLUDING SAME | G.I.TECH CO., LTD. (KR) | 2026-05-21 | — | — | US | claimed |
| US-20260140288-A1 | ENCAPSULATED DIFFUSER | VIAVI SOLUTIONS INC. (US) | 2026-05-21 | — | — | US | claimed |
| US-12633521-B2 | Silicon nanoparticles and methods for preparing silicon nanoparticles | ASPEN AEROGELS, INC. (US) | 2026-05-19 | — | — | US | claimed |
| CN-122036781-A | Preparation method of substituted silane bridged organosilicon room-temperature phosphorescent material | 贝利科技(重庆)有限公司 | 2026-05-15 | — | — | CN | claimed |
| CN-122007428-A | Metal powder preparation device and preparation method | 上海氢田新材料科技有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-122011396-A | Modified organic silicon resin and adhesive using same | 惠州市振源鑫电子材料有限公司 | 2026-05-12 | — | — | CN | claimed |
| US-4343829-A | Method of fabricating single-crystalline silicon films | HITACHI, LTD. (JP) | 1982-08-10 | — | — | US | claimed |
| US-4338354-A | DIELECTRIC MATERIAL NUCLEATION FOR USE IN CAPACITOR ANODES | INTERNATIONAL STANDARD ELECTRIC CORPORATION (US) | 1982-07-06 | — | — | US | claimed |
| US-4329274-A | VINYLSILANOL-AND HYDROGENSILANOL-END GROUPS; A HALOGENATED TETRAMERIC PLATINUM COMPLEX CATALYST; SHELF LIFE | GENERAL ELECTRIC COMPANY (US) | 1982-05-11 | — | — | US | claimed |
| US-4239867-A | Inhibited curable solventless organopolysiloxane compositions | DOW CORNING CORPORATION (US) | 1980-12-16 | — | — | US | claimed |
| US-4234713-A | TETRAMETHYLDIPHENYLDIVINYLTRISILOXANE | DOW CORNING CORPORATION (US) | 1980-11-18 | — | — | US | claimed |
| US-4224084-A | Method and structure for passivating a semiconductor device | RCA CORPORATION (US) | 1980-09-23 | — | — | US | claimed |
| US-4224233-A | Process for the production of alkylsilanes | DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) | 1980-09-23 | — | — | US | claimed |
| US-4218291-A | Process for forming metal and metal silicide films | VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) | 1980-08-19 | — | — | US | claimed |
| US-4130574-A | SILICON HYDRIDE, BORON TRIFLUORIDE | UNIVERSITY OF TOLEDO (US) | 1978-12-19 | — | — | US | claimed |
| US-3984587-A | Chemical vapor deposition of luminescent films | RCA CORPORATION (US) | 1976-10-05 | — | — | US | claimed |