SCHEMBL336952

SCHEMBL336952

COc1[c]c(-c2ccccc2OC)ccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.44
CA1 P00915 2/20 0.43
CA2 P00918 2/20 0.43
CA12 O43570 1/20 0.43
CA4 P22748 1/20 0.43
CA7 P43166 1/20 0.43
CA9 Q16790 1/20 0.43
CA14 Q9ULX7 1/20 0.43
ALDH1A1 P00352 5/20 0.42
SMN1; SMN2 Q16637 3/20 0.40
KDM4E B2RXH2 3/20 0.40
HPGD P15428 2/20 0.40
MEN1 O00255 1/20 0.40
MAPT P10636 1/20 0.40
RAB9A P51151 1/20 0.40
KMT2A Q03164 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
PTGS2 P35354 1/20 0.40
HTR7 P34969 3/20 0.38
METAP2 P50579 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27877116 0.80 CYP2A6 (0.36) ALDH1A1SMN1; SMN2KDM4EHPGDMEN1
SCHEMBL28436121 0.80 HDAC4 (0.44) CA1CA2CA12CA7CA9
SCHEMBL6311868 0.79 ALDH1A1 (0.39) ALDH1A1SMN1; SMN2KDM4EMEN1MAPT
SCHEMBL8131623 0.78 TRPA1 (0.33) ALDH1A1MAPT
SCHEMBL336435 0.75 PDE4B (0.38) CA1CA2CA12CA4CA7
SCHEMBL336434 0.73 APP (0.47) APPCA1CA2CA12CA4
SCHEMBL28926495 0.73 APP (0.43) APPCA1CA2CA12CA4
SCHEMBL301996 0.72 CA1 (0.71) APPCA1CA2CA12CA4
SCHEMBL29788337 0.72 CA1 (0.71) APPCA1CA2CA12CA4
SCHEMBL29429633 0.72 CA1 (0.71) APPCA1CA2CA12CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023120742-A1 PHARMACEUTICAL COMPOSITION COMPRISING A QUINAZOLINE COMPOUND ASTELLAS PHARMA INC. (JP) 2023-06-29 WO disclosed
CN-102531954-B Method for synthesizing aromatic azo compounds UNIV TSINGHUA GRADUATE SCHOOL 2014-09-24 CN disclosed
US-8765868-B2 Resin composition for insulating film or surface-protective film of electronic components, method for producing pattern-cured film and electronic components HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2014-07-01 US disclosed
EP-2585462-A1 FUSED HETEROCYCLIC COMPOUNDS AS PHOSPHODIESTERASES (PDES) INHIBITORS Takeda Pharmaceutical Company Limited (JP) 2013-05-01 EP disclosed
CN-102531954-A Method for synthesizing aromatic azo compounds UNIV TSINGHUA GRADUATE SCHOOL 2012-07-04 CN disclosed
US-8097386-B2 Positive-type photosensitive resin composition, method for producing patterns, and electronic parts HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2012-01-17 US disclosed
US-20110027544-A1 Resin composition for insulating film or surface-protective film of electronic components, method for producing pattern-cured film and electronic components HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2011-02-03 US disclosed
US-20100227126-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNS, AND ELECTRONIC PARTS HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2010-09-09 US disclosed