⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL762384 | 0.84 | — | — | |
| SCHEMBL25612358 | 0.76 | GSK3A (0.36) | — | |
| SCHEMBL7946913 | 0.73 | — | — | |
| SCHEMBL4121489 | 0.73 | — | — | |
| SCHEMBL7782427 | 0.73 | — | — | |
| SCHEMBL7787242 | 0.72 | — | — | |
| SCHEMBL8545704 | 0.71 | DHFR (0.33) | — | |
| SCHEMBL6195190 | 0.71 | — | — | |
| SCHEMBL4479063 | 0.70 | HEXA (0.34) | — | |
| SCHEMBL12395182 | 0.70 | DHFR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0219626-A2 | Film-forming compositions comprising polyglutarimide | International Business Machines Corporation (US) | 1987-04-29 | — | — | EP | claimed |
| CN-115903379-A | Photoresist composition and pattern forming method | 罗门哈斯电子材料有限责任公司 | 2023-04-04 | — | — | CN | disclosed |
| CN-115903382-A | Photoresist composition and pattern forming method | 罗门哈斯电子材料有限责任公司 | 2023-04-04 | — | — | CN | disclosed |
| CN-115894781-A | Photoresist composition and pattern forming method | 罗门哈斯电子材料有限责任公司 | 2023-04-04 | — | — | CN | disclosed |
| CN-115894243-A | Iodine-containing acid-cleavable compounds, polymers derived therefrom and photoresist compositions | 罗门哈斯电子材料有限责任公司 | 2023-04-04 | — | — | CN | disclosed |
| CN-115808844-A | Photoresist composition comprising amide compound and pattern forming method using the same | 罗门哈斯电子材料韩国有限公司 | 2023-03-17 | — | — | CN | disclosed |
| CN-114690552-A | Photoresist composition and pattern forming method | 罗门哈斯电子材料有限责任公司 | 2022-07-01 | — | — | CN | disclosed |
| CN-114456113-A | Sulfonic acid derivative compounds as photoacid generators in resist applications | 贺利氏电子化工有限责任公司 | 2022-05-10 | — | — | CN | disclosed |
| CN-114442426-A | Photoresist composition and pattern forming method | 罗门哈斯电子材料有限责任公司 | 2022-05-06 | — | — | CN | disclosed |
| CN-114253071-A | Photoresist composition and pattern forming method | 罗门哈斯电子材料有限责任公司 | 2022-03-29 | — | — | CN | disclosed |
| US-7169795-B2 | Sulfonylaminovalerolactams and derivatives thereof as factor Xa inhibitors | BRISTOL MYERS SQUIBB COMPANY (US) | 2007-01-30 | — | — | US | disclosed |
| EP-0267277-B1 | COMPOSITIONS COMPRISING 1-SUBSTITUTED LACTAMS | WHITBY RESEARCH INC (US) | 1994-01-19 | — | — | EP | disclosed |
| EP-0325613-B1 | PENETRATION ENHANCERS FOR TRANSDERMAL DELIVERY OF SYSTEMIC AGENTS | WHITBY RESEARCH, Inc. (US) | 1993-09-08 | — | — | EP | disclosed |
| US-5142044-A | Lactam derivatives | WHITBY RESEARCH, INC. (US) | 1992-08-25 | — | — | US | disclosed |
| EP-0267277-A4 | COMPOSITIONS COMPRISING 1-SUBSTITUTED LACTAMS. | NELSON RES & DEV COMPANY (US) | 1990-03-21 | — | — | EP | disclosed |
| US-4801586-A | N-HETEROCYCLES | NELSON RESEARCH & DEVELOPMENT CO. (US) | 1989-01-31 | — | — | US | disclosed |
| US-4755535-A | Compositions comprising 1-substituted azacycloalkenes | NELSON RESEARCH & DEVELOPMENT CO. (US) | 1988-07-05 | — | — | US | disclosed |
| EP-0267277-A1 | COMPOSITIONS COMPRISING 1-SUBSTITUTED LACTAMS. | NELSON RES & DEV (US) | 1988-05-18 | — | — | EP | disclosed |
| WO-1987006583-A1 | COMPOSITIONS COMPRISING 1-SUBSTITUTED LACTAMS | NELSON RESEARCH AND DEVELOPMENT COMPANY (US) | 1987-11-05 | — | — | WO | disclosed |
| EP-0219626-A2 | Film-forming compositions comprising polyglutarimide | International Business Machines Corporation (US) | 1987-04-29 | — | — | EP | disclosed |