SCHEMBL3372053

SCHEMBL3372053

C1CC(OC2CCOC2)CO1

nearest known ligand 0.36

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LRRK2 Q5S007 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5654718 0.89
SCHEMBL12949311 0.87 PDE4A (0.31)
SCHEMBL12949425 0.87 PDE4A (0.31)
SCHEMBL12949467 0.87 PDE4A (0.31)
SCHEMBL18577963 0.85
SCHEMBL11451410 0.85 ALDH1A1 (0.30)
SCHEMBL18555995 0.85
SCHEMBL2013966 0.85
SCHEMBL24246548 0.83 GPR119 (0.31)
SCHEMBL938623 0.83 GPR119 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0464058-B1 FERROELECTRIC LIQUID CRYSTAL MIXTURES HOECHST AG (DE) 1995-06-14 EP claimed
US-5378394-A Pyrimidine compounds HOECHST AKTIENGESELLSCHAFT (DE) 1995-01-03 US claimed
US-8361697-B2 Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board ASAHI KASEI E-MATERIALS CORPORATION (JP) 2013-01-29 US disclosed
US-20100297559-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN AND PROCESS FOR PRODUCING PRINTED CIRCUIT BOARD, LEAD FRAME, SEMICONDUCTOR PACKAGE AND CONCAVOCONVEX BOARD ASAHI KASEI E-MATERIALS CORPORATION (JP) 2010-11-25 US disclosed
US-20100159691-A1 PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE ASAHI KASEI EMD CORPORATION (JP) 2010-06-24 US disclosed
EP-0774687-B1 Solid processing composition and method for processing silver halide photographic light-sensitive material KONISHIROKU PHOTO IND (JP) 2004-09-15 EP disclosed
US-5851742-A Solid processing composition and method for processing silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1998-12-22 US disclosed
EP-0774687-A1 Solid processing composition and method for processing silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1997-05-21 EP disclosed
US-5378394-A Pyrimidine compounds HOECHST AKTIENGESELLSCHAFT (DE) 1995-01-03 US disclosed