SCHEMBL3376127

SCHEMBL3376127

CCC(C(=N)N)C(=N)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL915983 0.97 NOS3 (0.35)
Hydrochloric Acid SCHEMBL916792 0.97 NOS3 (0.35)
SCHEMBL3058579 0.83
SCHEMBL7079232 0.83
SCHEMBL1736023 0.83
SCHEMBL2943980 0.73
SCHEMBL10457272 0.72 NOS3 (0.33)
SCHEMBL3082730 0.72 CYP1A2 (0.30)
SCHEMBL3076113 0.71 CA2 (0.43)
SCHEMBL25078714 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1999162-B1 WATER-SOLUBLE MACROMONOMERS CONTAINING TERMINAL UNSATURATION AND A PROCESS FOR THE PREPARATION THEREOF COUNCIL SCIENT IND RES (IN) 2010-11-03 EP claimed
CN-109364130-B Application of spina gleditsiae counterfeit product in preparation of antioxidant 深圳市药品检验研究院(深圳市医疗器械检测中心) 2021-11-09 CN disclosed
EP-3344664-A1 BIOCIDAL MIXTURES Lanxess Deutschland GmbH (DE) 2018-07-11 EP disclosed
CN-103619982-B Neutralizing salt for polishing liquid, polishing liquid for electronic material, polishing method, and method for producing electronic material SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2015-09-30 CN disclosed
CN-103619982-A Neutralizing salt for polishing liquid, polishing liquid for electronic material, polishing method, and method for producing electronic material SANYO CHEMICAL IND LTD 2014-03-05 CN disclosed
CN-100526381-C Flame-retardant aqueous resin composition CLARIANT POLYMERS KABUSHIKI KA (JP) 2009-08-12 CN disclosed
CN-100395282-C Resin particle and method for producing same SANYO CHEMICAL IND LTD (JP) 2008-06-18 CN disclosed
CN-101006149-A Water and oil repellent composition DAIKIN IND LTD (JP) 2007-07-25 CN disclosed
CN-1898321-A Flame-retardant aqueous resin composition CLARIANT POLYMERS KABUSHIKI KA (JP) 2007-01-17 CN disclosed
CN-1823119-A Resin particle and method for producing same SANYO CHEMICAL IND LTD (JP) 2006-08-23 CN disclosed
CN-1209397-C Resin dispersion having uniform particle size, resin particle, and method for producing same SANYO CHEMICAL IND LTD (JP) 2005-07-06 CN disclosed
CN-1188444-C Polyurethane foam, process for producing the same, and foam-forming composition SANYO CHEMICAL IND LTD (JP) 2005-02-09 CN disclosed
EP-1472319-A1 NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2004-11-03 EP disclosed
WO-2003060192-A1 NON-TOXIC CORROSION-PROTECTION RINSES AND SEALS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060019-A1 NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
CN-1400984-A Resin dispersions having uniform particle diameters, resin particles and processes for producing both SANYO CHEMICAL IND LTD (JP) 2003-03-05 CN disclosed
CN-1087328-C Blood-absorbent resin composition and absorbent articles NIPPON CATALYTIC CHEM IND (JP) 2002-07-10 CN disclosed
CN-1251596-A Polyurethane foam, process for producing same and foam forming composition SANYO CHEMICAL IND LTD (JP) 2000-04-26 CN disclosed
CN-1154128-A Blood-absorbent resin composition and absorbent articles NIPPON CATALYTIC CHEM IND (JP) 1997-07-09 CN disclosed