Acetic Acid

Acetic Acid

SCHEMBL3382899

CC(=O)O.CCCC(O)O.COC

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM1 P11229 1/20 0.44
AKR1A1 P14550 1/20 0.44
CHRM3 P20309 1/20 0.44
HTR2A P28223 1/20 0.44
HTR2C P28335 1/20 0.44
ADRA1A P35348 1/20 0.44
HRH1 P35367 1/20 0.44
DRD3 P35462 1/20 0.44
SLC6A3 Q01959 1/20 0.44
HDAC1 Q13547 1/20 0.44
HDAC2 Q92769 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
CYP3A4 P08684 2/20 0.37
TSHR P16473 2/20 0.37
NFKB1 P19838 2/20 0.37
NPSR1 Q6W5P4 2/20 0.37
GPR84 Q9NQS5 7/20 0.37
FFAR1 O14842 1/20 0.37
FFAR3 O14843 1/20 0.35
LCK P06239 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL11353075 0.92 CHRM1 (0.50) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL11353114 0.92 CHRM1 (0.50) CHRM1AKR1A1CHRM3HTR2AHTR2C
Ether SCHEMBL28080804 0.91 CHRM1 (0.38) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL29215809 0.90 CHRM1 (0.48) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL28196090 0.90 CHRM1 (0.48) CHRM1AKR1A1CHRM3HTR2AHTR2C
Methoxymethane SCHEMBL107532 0.87
Methoxymethane SCHEMBL3268353 0.87 TSHR (0.36) CHRM1AKR1A1CHRM3HTR2AHTR2C
Ether SCHEMBL3377966 0.86 CHRM1 (0.41) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL3380950 0.84 HSD17B10 (0.41) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL3379500 0.84 GPR84 (0.52) NFKB1GPR84FFAR1LCKCA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115968873-A Stable-component insecticide containing deltamethrin and preparation method thereof 佛山市正典生物技术有限公司 2023-04-18 CN claimed
CN-114085311-B Method for preparing high-purity photoresist resin 宁波南大光电材料有限公司 2023-03-14 CN claimed
CN-114292353-B ArF photoresist resin and preparation process thereof 宁波南大光电材料有限公司 2023-11-03 CN disclosed
CN-114085311-B Method for preparing high-purity photoresist resin 宁波南大光电材料有限公司 2023-03-14 CN disclosed
CN-114085311-A Method for preparing high-purity photoresist resin 宁波南大光电材料有限公司 2022-02-25 CN disclosed
CN-109196013-B Process for producing polyurethane, epoxy carboxylate composition, polyurethane, and polyurethane resin composition 昭和电工株式会社 2021-02-09 CN disclosed
CN-110248750-A The manufacturing method of copper powder, resin combination, the method and solidfied material for forming solidfied material 株式会社ADEKA 2019-09-17 CN disclosed
CN-107075681-B Copper film forms the manufacturing method of the copper film with composition and using it 株式会社ADEKA 2019-04-23 CN disclosed
CN-106795630-B Copper film forms the manufacturing method of the copper film with composition and using it 株式会社ADEKA 2019-04-02 CN disclosed
CN-109134826-A Reactive polycarboxylic acid compound, cured product of active energy ray-curable resin composition, and article 日本化药株式会社 2019-01-04 CN disclosed
CN-108931886-A Curable adhensive compositions, hardenite and liquid crystal display element 捷恩智株式会社 2018-12-04 CN disclosed
CN-105980599-A Composition for forming copper film and method for producing copper film using same 株式会社ADEKA 2016-09-28 CN disclosed
CN-104364290-B Hardening resin composition, resin combination, resin sheet and these compositions and the solidfied material of resin sheet ADEKA株式会社 2016-09-07 CN disclosed
CN-105934713-A Active energy ray-curable resin composition, and spacer for display elements and/or color filter protective film using same 日本化药株式会社 2016-09-07 CN disclosed
CN-105009227-A OXIDE SUPERCONDUCTOR COMPOSITION, OXIDE SUPERCONDUCTOR WIRE, AND PRODUCTION METHOD FOR OXIDE SUPERCONDUCTOR WIRE INT SUPERCONDUCTIVITY TECH 2015-10-28 CN disclosed
CN-104813741-A Resin composition, and cured product (1) thereof NIPPON KAYAKU KK 2015-07-29 CN disclosed
CN-104662645-A Chemical solution for forming protective film CENTRAL GLASS CO LTD 2015-05-27 CN disclosed
EP-2009070-B1 Ink-jet ink and method of producing the same, color filter and method of producing the same, display device, and method of forming functional film FUJIFILM CORP (JP) 2010-11-24 EP disclosed
US-20090035535-A1 INK-JET INK AND METHOD OF PRODUCING THE SAME, COLOR FILTER AND METHOD OF PRODUCING THE SAME, DISPLAY DEVICE, AND METHOD OF FORMING FUNCTIONAL FILM FUJIFILM CORPORATION (JP) 2009-02-05 US disclosed
EP-2009070-A1 Ink-jet ink and method of producing the same, color filter and method of producing the same, display device, and method of forming functional film FUJIFILM Corporation (JP) 2008-12-31 EP disclosed