SCHEMBL3378504

SCHEMBL3378504

C=C[Si](OCC)(OCC)OCCN1CCCCC1

nearest known ligand 0.37

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.36
PSMB1 P20618 5/20 0.35
PSMB5 P28074 5/20 0.35
PSMB2 P49721 4/20 0.35
ALDH1A1 P00352 3/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
LTA4H P09960 2/20 0.33
TSHR P16473 1/20 0.33
HTT P42858 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
HRH3 Q9Y5N1 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8096866 0.77 PSMB1 (0.37) PSMB1PSMB5PSMB2SMN1; SMN2HRH3
SCHEMBL27638052 0.75 KDM4E (0.40) KDM4EPSMB1PSMB5PSMB2ALDH1A1
SCHEMBL22548 0.73
SCHEMBL27823328 0.73
SCHEMBL931235 0.72
SCHEMBL8436239 0.72
SCHEMBL31432764 0.71
SCHEMBL7583255 0.71
Ethylene SCHEMBL9421815 0.71
Hydroxyl Radical SCHEMBL28871487 0.71 TSHR (0.32) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020116367-A1 POLYBUTADIENE AND METHOD FOR PRODUCING SAME 宇部興産株式会社 2020-06-11 WO disclosed
CN-104487459-A Modified cis-1, 4-polybutadiene and method for producing same UBE INDUSTRIES 2015-04-01 CN disclosed
EP-1452549-B1 PROCESS FOR PRODUCING MODIFIED POLYMER, APPARATUS FOR PRODUCING MODIFIED POLYMER, AND MODIFIED POLYMER SEKISUI CHEMICAL CO LTD (JP) 2010-11-17 EP disclosed
US-7629419-B2 Process for producing modified polymer, apparatus for producing modified polymer, and modified polymer SEKISUI CHEMICAL CO., LTD. (JP) 2009-12-08 US disclosed
US-20050053792-A1 High purity; using supercritical fluid; high temperature; high pressure; polyolefins; interface film for glass; ceramic binder SEKISUI CHEMICAL CO., LTD. (JP) 2005-03-10 US disclosed
EP-1452549-A1 PROCESS FOR PRODUCING MODIFIED POLYMER, APPARATUS FOR PRODUCING MODIFIED POLYMER, AND MODIFIED POLYMER SEKISUI CHEMICAL CO., LTD. (JP) 2004-09-01 EP disclosed
US-6001165-A FOR INK JET PRINTERS WHICH ABSORBS INK RAPIDLY, DOES NOT BLOT, WATER RESISTANCE OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) 1999-12-14 US disclosed
EP-0887200-A1 Coating composition for recording material and process for producing recording material OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) 1998-12-30 EP disclosed
US-5622784-A WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM SEIKO EPSON CORPORATION (JP) 1997-04-22 US disclosed