SCHEMBL8096866

SCHEMBL8096866

C=C[Si](C)(C)OCCN1CCCCC1

nearest known ligand 0.37

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
PSMB1 P20618 6/20 0.37
PSMB5 P28074 6/20 0.37
PSMB2 P49721 5/20 0.37
HRH3 Q9Y5N1 5/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3378504 0.77 KDM4E (0.36) PSMB1PSMB5PSMB2HRH3SMN1; SMN2
SCHEMBL10592205 0.76 CARM1 (0.39) PSMB1PSMB5PSMB2HRH3TDP1
SCHEMBL14855784 0.72 PSMB1 (0.42) PSMB1PSMB5PSMB2HRH3SMN1; SMN2
SCHEMBL27638052 0.72 KDM4E (0.40) PSMB1PSMB5PSMB2HRH3SMN1; SMN2
SCHEMBL2501222 0.71 HRH3 (0.39) PSMB1PSMB5PSMB2HRH3SMN1; SMN2
SCHEMBL8102887 0.70
SCHEMBL1883485 0.70 HRH3 (0.42) PSMB1PSMB5PSMB2HRH3
SCHEMBL2501999 0.68 CARM1 (0.37) PSMB1PSMB5PSMB2HRH3TDP1
SCHEMBL31481982 0.68 POLB (0.40) PSMB1PSMB5PSMB2HRH3TDP1
SCHEMBL2509146 0.68 HRH3 (0.46) HRH3SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
US-5622784-A WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM SEIKO EPSON CORPORATION (JP) 1997-04-22 US disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed