SCHEMBL3390044

SCHEMBL3390044

CC(C)(O)CC(C(C)(C)O)S(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2817270 0.98
SCHEMBL773140 0.82
SCHEMBL7158908 0.77
SCHEMBL28931769 0.73 ALDH1A1 (0.30)
SCHEMBL11869102 0.73 FDPS (0.32)
SCHEMBL355936 0.73 DPP7 (0.34)
SCHEMBL3181511 0.70
SCHEMBL2742784 0.68
SCHEMBL28769192 0.67
Hexylene Glycol SCHEMBL7622994 0.67 PIK3CD (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12630672-B2 Crystalline polyester resin and polyester resin aqueous dispersion, and composition for adhesion or coating use in which each of said crystalline polyester resin and polyester resin aqueous dispersion is used TOYOBO MC CORPORATION (JP) 2026-05-19 US disclosed
EP-4703144-A1 IMAGE FORMING METHOD AND IMAGE FORMING SYSTEM KONICA MINOLTA, INC. (JP) 2026-03-04 EP disclosed
EP-4685198-A1 INK SET, INKJET RECORDING METHOD, AND INKJET RECORDING SYSTEM KONICA MINOLTA, INC. (JP) 2026-01-28 EP disclosed
US-12421363-B2 White easy-adhesive polyester film comprising a nitrogen-containing antistatic agent TOYOBO CO., LTD. (JP) 2025-09-23 US disclosed
EP-4599013-A1 URETHANE (METH)ACRYLATES FOR USE IN RECYCLING OR DELAMINATION PROCESSES ARKEMA FRANCE (FR) 2025-08-13 EP disclosed
CN-120051540-A Urethane (meth) acrylates for use in recycling or delamination processes 阿科玛法国公司 2025-05-27 CN disclosed
CN-119907841-A Hollow polyester-based easy-to-adhere film 东洋纺株式会社 2025-04-29 CN disclosed
EP-4296322-B1 INK SET AND INK-JET RECORDING METHOD KONICA MINOLTA INC (JP) 2025-03-05 EP disclosed
US-20250059321-A1 AQUEOUS DISPERSION COMPOSITION CONTAINING POLYESTER RESIN TOYOBO MC CORPORATION (JP) 2025-02-20 US disclosed
EP-4494886-A1 IMAGE-FORMING METHOD AND IMAGE-FORMING DEVICE KONICA MINOLTA, INC. (JP) 2025-01-22 EP disclosed
US-6077917-A Coating resin composition TOYO BOSEKI KABUSHIKI KAISHA (JP) 2000-06-20 US disclosed
EP-0992548-A2 Anticorrosive primer composition Toyo Boseki Kabushiki Kaisha (JP) 2000-04-12 EP disclosed
EP-0691388-B1 Coating resin compositions TOYO BOSEKI (JP) 1999-12-08 EP disclosed
EP-0942022-A1 Hardenable polyurethane polymerisate, dispersion based thereon, its preparation process and its use BASF AKTIENGESELLSCHAFT (DE) 1999-09-15 EP disclosed
EP-0889104-A2 Coating resin compositions Toyo Boseki Kabushiki Kaisha (JP) 1999-01-07 EP disclosed
EP-0752456-A2 Coating resin composition TOYO BOSEKI KABUSHIKI KAISHA (JP) 1997-01-08 EP disclosed
US-5563223-A CURABLE POLYESTER; FILM HAVING SUPERIOR HARDNESS, ANTISOILANT, WEATHERPROOFING, RESISTANCE TO STAINING BY FOOD-STUFF, BOILING WATER AND CORROSION RESISTANCE TOYO BOSEKI KABUSHIKI KAISHA (JP) 1996-10-08 US disclosed
US-5563236-A POLYESTER CONTAINING A METAL SULFONATE GROUP TOYO BOSEKI KABUSHIKI KAISHA (JP) 1996-10-08 US disclosed
US-5510417-A CONSISTS OF A POLYESTER OF AROMATIC DICARBOXYLIC, POLYCAROXYLIC ACIDS, AN ADDITION PRODUCT OF BISPHENOL A AND ETHYLENE OXIDE OR PROPYLENE OXIDE, A DICAROXYLIC ACID WITH METAL SULFONATE; WATER, NEUTRALIZER AND AN ORGANIC COMPOUND TOYO BOSEKI KABUSHIKI KAISHA (JP) 1996-04-23 US disclosed
EP-0691388-A1 Coating resin compositions Toyo Boseki Kabushiki Kaisha (JP) 1996-01-10 EP disclosed