SCHEMBL3390981

SCHEMBL3390981

CCC=CC(=O)OCCOCC

nearest known ligand 0.52

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.52
TSHR P16473 4/20 0.52
THRB P10828 2/20 0.46
ATM Q13315 1/20 0.45
HCAR2 Q8TDS4 5/20 0.42
TP53 P04637 2/20 0.42
HIF1A Q16665 2/20 0.42
HSD17B10 Q99714 1/20 0.42
MAPT P10636 2/20 0.42
RAB9A P51151 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
APP P05067 1/20 0.35
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2897724 0.87 ALDH1A1 (0.60) ALDH1A1TSHRTHRBATMHCAR2
SCHEMBL2898088 0.87 ALDH1A1 (0.60) ALDH1A1TSHRTHRBATMHCAR2
SCHEMBL2962177 0.85 ALDH1A1 (0.58) ALDH1A1TSHRTHRBATMHCAR2
SCHEMBL5182220 0.85 ALDH1A1 (0.58) ALDH1A1TSHRTHRBATMHCAR2
SCHEMBL3422605 0.83 ATM (0.60) ALDH1A1TSHRATMHCAR2TP53
SCHEMBL1070176 0.82 ALDH1A1 (0.54) ALDH1A1TSHRTHRBATMHCAR2
SCHEMBL1070177 0.82 ALDH1A1 (0.54) ALDH1A1TSHRTHRBATMHCAR2
Acetic Acid SCHEMBL28238975 0.82 ALDH1A1 (0.59) ALDH1A1TSHRTHRBATMHCAR2
SCHEMBL534938 0.82 ATM (0.47) ALDH1A1TSHRATMHCAR2TP53
SCHEMBL9561910 0.81 HCAR2 (0.63) ALDH1A1TSHRATMHCAR2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115584267-B Liquid crystal aligning agent and application thereof 波米科技有限公司 2023-08-04 CN disclosed
WO-2023032753-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2023-03-09 WO disclosed
CN-111575023-B Compound additive, liquid crystal aligning agent prepared from compound additive and liquid crystal aligning film 江苏三月科技股份有限公司 2022-03-01 CN disclosed
CN-108474976-B Optical element and method for manufacturing the same 公立大学法人兵库县立大学 2022-01-11 CN disclosed
US-20210371664-A1 LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT NISSAN CHEMICAL CORPORATION (JP) 2021-12-02 US disclosed
US-11111387-B2 Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2021-09-07 US disclosed
CN-109415571-B Method for producing fluororesin powder-containing liquid composition AGC株式会社 2021-08-03 CN disclosed
US-11028323-B2 Liquid crystal aligning agent containing crosslinking agent and polymer that has site having isocyanate group and/or blocked isocyanate group and site having photoreactivity, liquid crystal alignment film, and liquid crystal display element NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2021-06-08 US disclosed
US-10921650-B2 Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2021-02-16 US disclosed
CN-107473969-B Method for manufacturing substrate having liquid crystal alignment film for horizontal electric field drive type liquid crystal display element 日产化学工业株式会社 2020-10-16 CN disclosed
US-20160185905-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-06-30 US disclosed
US-20100119969-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DPOLYHYDROXYAMIDE RESIN NISSAN CHEMICAL INDUSTRIES LTD. (JP) 2010-05-13 US disclosed
EP-2159637-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN Nissan Chemical Industries, Ltd. (JP) 2010-03-03 EP disclosed
CN-101226245-A Antireflection film and method for producing same DAXON TECHNOLOGY INC (CN) 2008-07-23 CN disclosed
US-6656660-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US disclosed
CN-1447677-A Use of hydrophilic graft copolymers with N-Vinylamine and/or open-chained N-vinylamide units in cosmetic formulations BASF AG (DE) 2003-10-08 CN disclosed
EP-1024406-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 2000-08-02 EP disclosed
EP-0661311-B1 Compound fine particles and compositions for forming film NIPPON CATALYTIC CHEM IND (JP) 1998-06-24 EP disclosed
US-5683501-A Compound fine particles and composition for forming film NIPPON SHOKUBAI CO., LTD. (JP) 1997-11-04 US disclosed
EP-0661311-A2 Compound fine particles and compositions for forming film NIPPON SHOKUBAI CO., LTD. (JP) 1995-07-05 EP disclosed