Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | HCAR2 | Q8TDS4 | 5/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 4/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | APP | P05067 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 2/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2890674 | 0.84 | ATM (0.56) | ATMHCAR2MAPTSMN1; SMN2TSHR | |
| SCHEMBL403340 | 0.84 | ATM (0.56) | ATMHCAR2MAPTSMN1; SMN2TSHR | |
| SCHEMBL5974049 | 0.84 | ATM (0.56) | ATMHCAR2MAPTSMN1; SMN2TSHR | |
| SCHEMBL691276 | 0.83 | HCAR2 (0.63) | ATMHCAR2MAPTTSHRRAB9A | |
| SCHEMBL691277 | 0.83 | HCAR2 (0.63) | ATMHCAR2MAPTTSHRRAB9A | |
| SCHEMBL9561910 | 0.83 | HCAR2 (0.63) | ATMHCAR2MAPTTSHRRAB9A | |
| SCHEMBL7273202 | 0.82 | TSHR (0.41) | ATMHCAR2MAPTSMN1; SMN2TSHR | |
| SCHEMBL3390981 | 0.82 | ALDH1A1 (0.52) | ATMHCAR2MAPTTSHRRAB9A | |
| SCHEMBL181611 | 0.82 | ATM (0.45) | ATMHCAR2MAPTTSHRRAB9A | |
| SCHEMBL7305817 | 0.82 | TSHR (0.41) | ATMHCAR2MAPTSMN1; SMN2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2047908-B1 | METHOD FOR PREPARING A HYDROGENATION CATALYST COMPOSITION AND USE THEREOF | CHINA PETROLEUM & CHEM CORP (CN) | 2017-02-22 | — | — | EP | claimed |
| US-8329610-B2 | Hydrogenation catalyst composition, process for preparing the same and use thereof | CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2012-12-11 | — | — | US | claimed |
| US-20090308790-A1 | HYDROGENATION CATALYST COMPOSITION, PROCESS FOR PREPARING THE SAME AND USE THEREOF | CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2009-12-17 | — | — | US | claimed |
| EP-2047908-A1 | A HYDROGENATED CATALYST COMPOSITION AND ITS PREPARING METHOD AND USE | China Petroleum & Chemical Corporation (CN) | 2009-04-15 | — | — | EP | claimed |
| CN-1184869-C | Integrated manufacturing packaging process | IBM (US) | 2005-01-12 | — | — | CN | claimed |
| US-6063543-A | Radiation-sensitive mixture and its use | SIEMENS AKTIENGESELLSCHAFT (DE) | 2000-05-16 | — | — | US | claimed |
| CN-1222825-A | Integrated manufacturing packaging process | IBM (US) | 1999-07-14 | — | — | CN | claimed |
| US-20250239451-A1 | HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2025-07-24 | — | — | US | disclosed |
| US-12187942-B2 | Cadmium free quantum dot including lithium, production method thereof, and electronic device including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-07 | — | — | US | disclosed |
| US-12130508-B2 | Quantum dots and devices including the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2024-10-29 | — | — | US | disclosed |
| US-20240319605-A1 | HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2024-09-26 | — | — | US | disclosed |
| US-12049581-B2 | Zinc tellurium selenium based quantum dot | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-30 | — | — | US | disclosed |
| US-20240176171-A1 | QUANTUM DOTS AND DEVICES INCLUDING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2024-05-30 | — | — | US | disclosed |
| US-5683501-A | Compound fine particles and composition for forming film | NIPPON SHOKUBAI CO., LTD. (JP) | 1997-11-04 | — | — | US | disclosed |
| WO-1997000465-A1 | RESIN COMPOSITIONS FOR PHOTORESIST APPLICATIONS | CLARIANT INTERNATIONAL LTD. (CH) | 1997-01-03 | — | — | WO | disclosed |
| EP-0735422-A1 | Radiation-sensitive composition containing plasticizer | HOECHST INDUSTRY LIMITED (JP) | 1996-10-02 | — | — | EP | disclosed |
| EP-0661311-A2 | Compound fine particles and compositions for forming film | NIPPON SHOKUBAI CO., LTD. (JP) | 1995-07-05 | — | — | EP | disclosed |
| US-5194543-A | Containing hydrolyzable and nonhydrolyzing vinyl ester copolymers; industrial finishes | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-03-16 | — | — | US | disclosed |
| US-4929724-A | PHOSPHOROUS-NITROGEN DIMERIZATION CATALYSTS | BAYER AKTIENGESELLSCHAFT (DE) | 1990-05-29 | — | — | US | disclosed |
| US-4859755-A | Crosslinkable, fluorine-containing copolymers as binders for highly weather-resistant surface coatings | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-08-22 | — | — | US | disclosed |