SCHEMBL3393201

SCHEMBL3393201

C=C(C)C(=O)OC(C)(C)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
ALOX15 P16050 1/20 0.48
MAPK1 P28482 1/20 0.47
CYP2C19 P33261 1/20 0.44
HIF1A Q16665 1/20 0.44
ELANE P08246 1/20 0.44
MAPT P10636 1/20 0.41
KMT2A Q03164 1/20 0.41
KCNN4 O15554 1/20 0.40
HDAC3 O15379 1/20 0.39
HDAC4 P56524 1/20 0.39
HDAC1 Q13547 1/20 0.39
HDAC7 Q8WUI4 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC10 Q969S8 1/20 0.39
HDAC11 Q96DB2 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
HDAC6 Q9UBN7 1/20 0.39
HDAC9 Q9UKV0 1/20 0.39
HDAC5 Q9UQL6 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethane SCHEMBL28621749 0.98 ALDH1A1 (0.47) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL10027331 0.90 ALDH1A1 (0.39) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL16858286 0.90 CYP2C9 (0.43) ALDH1A1ALOX15MAPK1ELANEMAPT
SCHEMBL3180129 0.87 CYP2C19 (0.46) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL8647287 0.86 ALDH1A1 (0.58) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL1153548 0.85 ELANE (0.44) ALDH1A1ALOX15CYP2C19HIF1AELANE
SCHEMBL16858289 0.85 HDAC1 (0.40) ALDH1A1ALOX15MAPK1HIF1AMAPT
SCHEMBL10934421 0.84 ALDH1A1 (0.47) ALDH1A1ALOX15MAPK1CYP2C19HIF1A
SCHEMBL14827345 0.84 TSHR (0.39) ALDH1A1ELANEMAPTKMT2AHDAC1
SCHEMBL11876274 0.84 CYP2C19 (0.43) ALDH1A1ALOX15MAPK1CYP2C19HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 377 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7094860-B2 Maleimide group-containing polymer particles and method of producing the same FUJI XEROX CO., LTD. (JP) 2006-08-22 US claimed
US-20050157999-A1 Graded index polymer optical fiber and a method of making the same GENERAL COMPONENTS, INC. 2005-07-21 US claimed
US-20050014924-A1 Maleimide group-containing polymer particles and method of producing the same FUJI XEROX CO., LTD. (JP) 2005-01-20 US claimed
US-20030132536-A1 Method of making a graded index polymer optical fiber GENERAL COMPONENTS, INC. 2003-07-17 US claimed
US-20030134119-A1 Graded index polymer optical fiber and a method of making the same GENERAL COMPONENTS, INC. 2003-07-17 US claimed
EP-0465064-B1 Process for forming patterns FUJITSU LTD (JP) 1998-12-09 EP claimed
EP-0465064-A2 Resist and process for forming patterns using the same FUJITSU LIMITED (JP) 1992-01-08 EP claimed
EP-0158357-B1 METHOD OF FORMING RESIST MICROPATTERN NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) 1991-02-27 EP claimed
JP-5259068-A None JP disclosed
JP-58184944-A None JP disclosed
US-12372867-B2 Photoresists comprising multiple acid generator compounds DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) 2025-07-29 US disclosed
EP-3114164-B1 LOWER TEMPERATURE CURE COATING COMPOSITIONS KING INDUSTRIES INC (US) 2025-07-02 EP disclosed
EP-4267708-B1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS INFINEUM INT LTD (GB) 2025-07-02 EP disclosed
US-12281203-B2 Thermally responsive brush polymers having a copolymer backbone and copolymer arms INFINEUM INTERNATIONAL LIMITED (GB) 2025-04-22 US disclosed
US-4417022-A SOLVENT-FREE PPG INDUSTRIES, INC. (US) 1983-11-22 US disclosed
JP-S58184944-A PATTERN FORMING MATERIAL FUJITSU LTD 1983-10-28 JP disclosed
US-4343925-A POLYESTERS PPG INDUSTRIES, INC. (US) 1982-08-10 US disclosed
US-4317894-A Low temperature cure coating compositions PPG INDUSTRIES, INC. (US) 1982-03-02 US disclosed
US-4314918-A Coating compositions containing organic alcoholic reactive diluents PPG INDUSTRIES, INC. (US) 1982-02-09 US disclosed
US-4025407-A THERMOSETTING RESIN AND RADIATION SENSITIVE MATERIAL SUBJECTED TO IONIZING RADIATION OR ACTINIC LIGHT PPG INDUSTRIES, INC. (US) 1977-05-24 US disclosed