Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | ATM | Q13315 | 2/20 | 0.37 |
| ▸ | ELANE | P08246 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16858289 | 0.94 | HDAC1 (0.40) | ALDH1A1KMT2AALOX15TDP1MAPT | |
| SCHEMBL26059969 | 0.93 | ESR1 (0.42) | ALDH1A1ELANETSHR | |
| SCHEMBL14827345 | 0.93 | TSHR (0.39) | ALDH1A1KMT2AATMELANETDP1 | |
| SCHEMBL14827400 | 0.91 | CES2 (0.41) | ALDH1A1MAPTHDAC1CYP2C19SRD5A2 | |
| SCHEMBL14827323 | 0.91 | SMN1; SMN2 (0.40) | ALDH1A1KMT2AATMMAPTMAPK1 | |
| SCHEMBL24811772 | 0.91 | ALDH1A1 (0.33) | ALDH1A1KMT2AATMELANECYP17A1 | |
| SCHEMBL3393201 | 0.90 | ALDH1A1 (0.48) | ALDH1A1KMT2AATMELANEALOX15 | |
| SCHEMBL24667219 | 0.89 | MAPT (0.50) | ALDH1A1KMT2AATMELANEALOX15 | |
| Ethane SCHEMBL28621749 | 0.89 | ALDH1A1 (0.47) | ALDH1A1KMT2AATMELANEALOX15 | |
| SCHEMBL16858286 | 0.88 | CYP2C9 (0.43) | ALDH1A1KMT2AELANEALOX15MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-20110098413-A1 | Acrylic star polymer | NIPPON SODA CO., LTD (JP) | 2011-04-28 | — | — | US | disclosed |
| US-20110098413-A1 | Acrylic star polymer | NIPPON SODA CO., LTD (JP) | 2011-04-28 | — | — | US | disclosed |
| US-20110046333-A1 | ACRYLIC ACID-BASED POLYMER AND METHOD OF PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20110046333-A1 | ACRYLIC ACID-BASED POLYMER AND METHOD OF PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| US-7847045-B2 | Acrylic acid-based polymer and method of producing the same | NIPPON SODA CO., LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| US-7847045-B2 | Acrylic acid-based polymer and method of producing the same | NIPPON SODA CO., LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| US-20090209726-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090209726-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090111961-A1 | Acrylic Acid-Based Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-20090111961-A1 | Acrylic Acid-Based Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-7494759-B2 | Positive resist compositions and process for the formation of resist patterns with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-7494759-B2 | Positive resist compositions and process for the formation of resist patterns with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20070224538-A1 | Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224538-A1 | Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |