SCHEMBL339998

SCHEMBL339998

CC(C)CN(CCO)CCO

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.45
CYP1A2 P05177 2/20 0.40
MAPK1 P28482 2/20 0.40
CA12 O43570 3/20 0.39
CA1 P00915 3/20 0.39
CA2 P00918 3/20 0.39
CA9 Q16790 3/20 0.39
ALDH1A1 P00352 2/20 0.37
TSHR P16473 2/20 0.37
KDM4E B2RXH2 4/20 0.35
CYP2C9 P11712 1/20 0.33
HPGD P15428 1/20 0.33
HIF1A Q16665 1/20 0.33
HSD17B10 Q99714 1/20 0.33
PIK3CD O00329 1/20 0.32
SLC29A1 Q99808 1/20 0.32
SMN1; SMN2 Q16637 2/20 0.31
ALOX15 P16050 1/20 0.31
LMNA P02545 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL557796 0.94 MAPT (0.45) MAPTCYP1A2MAPK1CA12CA1
SCHEMBL12039759 0.92 ALDH1A1 (0.43) MAPTCYP1A2MAPK1CA12CA1
SCHEMBL7933716 0.90 CYP1A2 (0.39) MAPTCYP1A2MAPK1CA12CA1
SCHEMBL3427669 0.90 MAPT (0.38) MAPTCYP1A2MAPK1CA12CA1
SCHEMBL4290820 0.88 MAPT (0.36) MAPTCYP1A2MAPK1CA12CA1
SCHEMBL27859031 0.88 MAPT (0.36) MAPTCYP1A2MAPK1CA12CA1
SCHEMBL7931178 0.87 CYP1A2 (0.43) MAPTCYP1A2MAPK1CA12CA1
SCHEMBL7927848 0.86 ALDH1A1 (0.36) MAPTCYP1A2MAPK1CA12CA1
SCHEMBL11210027 0.86 MAPT (0.46) MAPTCYP1A2MAPK1CA12CA1
SCHEMBL9641431 0.85 MAPT (0.38) MAPTCYP1A2MAPK1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 457 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12359125-B2 Silicon etchant composition, pattern formation method and manufacturing method of array substrate using the etchant composition, and array substrate manufactured therefrom DONGWOO FINE-CHEM CO., LTD. (KR) 2025-07-15 US claimed
US-20250026960-A1 POLISHING SLURRY COMPOSITION KCTECH CO.,LTD. (KR) 2025-01-23 US claimed
CN-118339245-A Polishing slurry composition 凯斯科技股份有限公司 2024-07-12 CN claimed
CN-118145912-A Composite air entraining agent for light concrete and preparation method thereof 科之杰新材料集团有限公司 2024-06-07 CN claimed
US-20240174797-A1 POLYESTERAMINES AND POLYESTERQUATS ARKEMA FRANCE (FR) 2024-05-30 US claimed
CN-117964278-A Composite light concrete air entraining agent and preparation method thereof 科之杰新材料集团有限公司 2024-05-03 CN claimed
CN-114231288-B Silicon etching liquid composition, pattern forming method, array substrate manufacturing method, and array substrate 东友精细化工有限公司 2023-12-26 CN claimed
US-11802179-B2 Polyesteramines and polyesterquats ARKEMA FRANCE (FR) 2023-10-31 US claimed
EP-3668652-B1 POLYESTERAMINES AND POLYESTER QUATS ARKEMA FRANCE (FR) 2023-09-06 EP claimed
WO-2023121037-A1 POLISHING SLURRY COMPOSITION 주식회사 케이씨텍 2023-06-29 WO claimed
US-20060100411-A1 Organometallic-free polyurethanes having low extractables LUBRIZOL ADVANCED MATERIALS, INC. 2006-05-11 US claimed
CN-1742032-A Organometallic-free polyurethanes having low extractables NOVEON IP HOLDINGS CORP (US) 2006-03-01 CN claimed
EP-1572773-A1 ORGANOMETALLIC-FREE POLYURETHANES HAVING LOW EXTRACTABLES Noveon IP Holdings Corp. (US) 2005-09-14 EP claimed
WO-2004060954-A1 ORGANOMETALLIC-FREE POLYURETHANES HAVING LOW EXTRACTABLES NOVEON IP HOLDINGS CORP. (US) 2004-07-22 WO claimed
US-20040122202-A1 Organometallic-free polyurethanes having low extractables NOVEON, INC. 2004-06-24 US claimed
EP-0752977-B1 AIR ENTRAINING AGENT FOR CONCRETES AND MORTARS KREMS CHEMIE AG (AT) 1998-10-28 EP claimed
US-5759259-A CONTAINING A ROSIN SALT KREMS CHEMIE AKTIENGESELLSCHAFT (AT) 1998-06-02 US claimed
EP-0752977-A1 AIR ENTRAINING AGENT Krems Chemie Aktiengesellschaft (AT) 1997-01-15 EP claimed
WO-1995026936-A1 AIR ENTRAINING AGENT KREMS CHEMIE AKTIENGESELLSCHAFT (AT) 1995-10-12 WO claimed
US-5201944-A Mixtures containing rosins esterified by alkanol tertiary amines and others by carbonylation with acrylic carbonyl compounds, casein, surfactants, and having nearly neutral PH HARIMA CHEMICALS, INC. (JP) 1993-04-13 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240174797-A1 POLYESTERAMINES AND POLYESTERQUATS PUF60, CUTA, ASH2L MAPT 1560/4885CYP1A2 3542/4885MAPK1 3948/4885
US-11802179-B2 Polyesteramines and polyesterquats PUF60, CUTA, ASH2L MAPT 1560/4885CYP1A2 3542/4885MAPK1 3948/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.