Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.62 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.55 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.55 |
| ▸ | TSHR | P16473 | 3/20 | 0.50 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.49 |
| ▸ | HTR1A | P08908 | 1/20 | 0.49 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.49 |
| ▸ | SCN1A | P35498 | 1/20 | 0.49 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.49 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.49 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.49 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.49 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.49 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21561547 | 0.90 | TDP1 (0.68) | LMNATDP1MAPK1HIF1ATSHR | |
| SCHEMBL26413289 | 0.88 | MAPT (0.49) | LMNATDP1MAPK1HIF1ATSHR | |
| SCHEMBL6934530 | 0.87 | LMNA (0.65) | LMNATDP1MAPK1HIF1ATSHR | |
| SCHEMBL25339994 | 0.86 | LMNA (0.62) | LMNATDP1MAPK1HIF1ATSHR | |
| SCHEMBL30829597 | 0.85 | LMNA (0.62) | LMNATDP1MAPK1HIF1ATSHR | |
| SCHEMBL21104459 | 0.84 | LMNA (0.61) | LMNATDP1MAPK1HIF1ATSHR | |
| SCHEMBL25458881 | 0.84 | LMNA (0.61) | LMNATDP1MAPK1HIF1ATSHR | |
| SCHEMBL8351678 | 0.84 | LMNA (0.61) | LMNATDP1MAPK1HIF1ATSHR | |
| SCHEMBL11192789 | 0.83 | LMNA (0.56) | LMNATDP1MAPK1HIF1ATSHR | |
| SCHEMBL2748818 | 0.83 | LMNA (0.56) | LMNATDP1MAPK1HIF1ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108008600-A | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2018-05-08 | — | — | CN | disclosed |
| CN-107924123-A | Photoetching material and its manufacture method, photoetching composition, pattern formation method and, compound, resin and their purification process | 学校法人关西大学 | 2018-04-17 | — | — | CN | disclosed |
| CN-107533290-A | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | 三菱瓦斯化学株式会社 | 2018-01-02 | — | — | CN | disclosed |
| CN-107428717-A | Resist composition, resist pattern forming method, and polyphenol compound used for same | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107430337-A | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107407874-A | Radiation-sensitive composition, amorphous film and corrosion-resisting pattern forming method | 三菱瓦斯化学株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-106957217-A | Polyphenol compound for anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2017-07-18 | — | — | CN | disclosed |
| CN-106462059-A | Resist material, resist composition, and resist pattern formation method | 三菱瓦斯化学株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-106133604-A | Protectant composition and protectant pattern forming method | 三菱瓦斯化学株式会社 | 2016-11-16 | — | — | CN | disclosed |
| CN-105264440-A | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2016-01-20 | — | — | CN | disclosed |
| CN-102648173-A | Cyclic compound, method for producing same, radiation sensitive composition, and method for forming resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-08-22 | — | — | CN | disclosed |
| CN-102597034-A | Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-07-18 | — | — | CN | disclosed |
| CN-102596874-A | Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-07-18 | — | — | CN | disclosed |
| CN-102498104-A | Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL CO | 2012-06-13 | — | — | CN | disclosed |
| US-20100233628-A1 | COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100233628-A1 | COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100233628-A1 | COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-09-16 | — | — | US | disclosed |
| CN-1942825-B | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2010-05-12 | — | — | CN | disclosed |
| CN-101528653-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-09-09 | — | — | CN | disclosed |
| CN-1942825-A | Resist composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-04-04 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100233628-A1 | COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | HRH3, C9, H1-2 | LMNA 2222/4885TDP1 3360/4885MAPK1 1170/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.