SCHEMBL3401100

SCHEMBL3401100

CS[S+](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8884033 0.82
SCHEMBL8376357 0.78
SCHEMBL10361273 0.76
SCHEMBL8773237 0.76
SCHEMBL5048850 0.71
SCHEMBL862565 0.67
Iodide SCHEMBL8508950 0.67
Dimethyl Sulfoxide SCHEMBL4968915 0.59
Dimethyl Sulfoxide SCHEMBL1851330 0.59
SCHEMBL31325256 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3897958-B1 METHOD AND DEVICE FOR PRODUCING SACCHARIDES AND SACCHARIDE ARRAYS MAX PLANCK GESELLSCHAFT (DE) 2023-06-21 EP claimed
CN-115548438-A Electrolyte additive and application thereof, lithium ion battery electrolyte and lithium ion battery 比亚迪股份有限公司 2022-12-30 CN claimed
EP-1053244-B1 GLYCOSIDATION OF 4,5-EPOXYMORPHINAN-6-OLS FINETECH LTD (IL) 2003-10-22 EP claimed
EP-0190534-B1 PROCESS FOR THE PREPARATION OF ERGOLINE DERIVATIVES SCHERING AKTIENGESELLSCHAFT (DE) 1988-11-30 EP claimed
JP-8073488-A None JP disclosed
US-11914294-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-27 US disclosed
US-20240027903-A1 Resist Material And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20240027909-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11860540-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-02 US disclosed
US-11835860-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
EP-0555058-B1 (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition TOYO INK MFG CO (JP) 1997-05-07 EP disclosed
US-5622971-A PIPERIDINE DERIVATIVES; HYPOTENSIVE AGENTS ABBOTT LABORATORIES (US) 1997-04-22 US disclosed
JP-H0873488-A PRODUCTION OF 1-(2-DEOXYRIBOFURANOYL)PYRIDAZINONE DERIVATIVE NOGUCHI KENKYUSHO 1996-03-19 JP disclosed
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed
WO-1996006095-A1 ENDOTHELIN ANTAGONISTS ABBOTT LABORATORIES (US) 1996-02-29 WO disclosed
US-5264567-A GM3 analogous compound MECT CORPORATION (JP) 1993-11-23 US disclosed
EP-0555058-A1 (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition TOYO INK MANUFACTURING CO., LTD. (JP) 1993-08-11 EP disclosed
EP-0482584-A2 GM3 analogous compound and preparation method thereof MECT CORPORATION (JP) 1992-04-29 EP disclosed