SCHEMBL340732

SCHEMBL340732

C=C[SiH2]CC(OCC)OCC

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.33
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3679767 0.82
SCHEMBL1271098 0.80 THRB (0.36) THRBLMNA
SCHEMBL3677725 0.79 TSHR (0.34)
SCHEMBL17418141 0.77 THRB (0.31) THRB
SCHEMBL340028 0.75
SCHEMBL6064162 0.73 THRB (0.31) THRB
SCHEMBL3684803 0.71
SCHEMBL6063908 0.71 TSHR (0.33)
SCHEMBL28638892 0.71 THRB (0.42) THRBLMNA
SCHEMBL4232562 0.69 THRB (0.40) THRBLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 185 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120040771-A Hafnium hybridization carbon-rich polysiloxane flexible ablation material, preparation method and application thereof 四川大学 2025-05-27 CN claimed
CN-114180623-A Method for preparing massive metal oxide-silicon oxide composite aerogel through click reaction 滁州学院 2022-03-15 CN claimed
US-7172657-B2 Cleaning method of treatment equipment and treatment equipment TOKYO ELECTRON LIMITED (JP) 2007-02-06 US claimed
EP-0854507-B1 Precursor with (alkoxy) (alkyl) vinylsilane ligand to deposit copper and method for the same SHARP KK (JP) 2006-06-07 EP claimed
EP-0854507-A2 Precursor with (alkyloxy) (alkyl) silylolefin ligand to deposit copper and method for the same SHARP KABUSHIKI KAISHA (JP) 1998-07-22 EP claimed
US-5767301-A COPPER HEXAFLUOROACETYLACETONATE WITH ETHOXYVINYLSILANE LIGAND; CHEMICAL VAPOR DEPOSITION SHARP MICROELECTRONICS TECHNOLOGY, INC. (US) 1998-06-16 US claimed
US-20250389016-A1 GAS BARRIER FILM MATERIAL, SILICON OXIDE FILM, AND PRODUCTION METHOD OF SILICON OXIDE FILM TOSOH CORP (JP) 2025-12-25 US disclosed
EP-4641292-A1 SILICONE PARTICLES AND LIGHT-DIMMING LAMINATE Sekisui Chemical Co., Ltd. (JP) 2025-10-29 EP disclosed
EP-4596511-A1 LAMINATED GLASS AND AUTOMOBILE SEKISUI CHEMICAL CO., LTD. (JP) 2025-08-06 EP disclosed
EP-3378914-B1 CONNECTING MATERIAL AND CONNECTION STRUCTURE SEKISUI CHEMICAL CO LTD (JP) 2025-08-06 EP disclosed
EP-4596510-A1 LIGHT MODULATING BODY, LAMINATED GLASS, AND AUTOMOBILE SEKISUI CHEMICAL CO., LTD. (JP) 2025-08-06 EP disclosed
WO-2025127132-A1 RESIN PARTICLES AND LIGHT CONTROL LAMINATE 積水化学工業株式会社 2025-06-19 WO disclosed
CN-120040771-A Hafnium hybridization carbon-rich polysiloxane flexible ablation material, preparation method and application thereof 四川大学 2025-05-27 CN disclosed
EP-1051461-A2 FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE ORR, William C. (US) 2000-11-15 EP disclosed
EP-0987346-A1 Copper deposition method using a precursor with (alkyloxy) (alkyl)silylolefin ligands Sharp Kabushiki Kaisha (JP) 2000-03-22 EP disclosed
WO-1999066009-A2 FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE ORR WILLIAM C (US) 1999-12-23 WO disclosed
EP-0855399-A2 Precursor with alkylaminosilylolefin ligands to deposit copper and method for same SHARP KABUSHIKI KAISHA (JP) 1998-07-29 EP disclosed
EP-0854507-A2 Precursor with (alkyloxy) (alkyl) silylolefin ligand to deposit copper and method for the same SHARP KABUSHIKI KAISHA (JP) 1998-07-22 EP disclosed
US-5767301-A COPPER HEXAFLUOROACETYLACETONATE WITH ETHOXYVINYLSILANE LIGAND; CHEMICAL VAPOR DEPOSITION SHARP MICROELECTRONICS TECHNOLOGY, INC. (US) 1998-06-16 US disclosed
US-4181788-A Process for the production of thermoplastic molding materials based on vinyl polymers BAYER AKTIENGESELLSCHAFT (DE) 1980-01-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250389016-A1 GAS BARRIER FILM MATERIAL, SILICON OXIDE FILM, AND PRODUCTION METHOD OF SILICON OXIDE FILM LBR, PIEZO1, RIF1 THRB 1726/4885LMNA 1942/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.