Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1B1 | Q16678 | 11/20 | 0.75 |
| ▸ | MAPT | P10636 | 7/20 | 0.75 |
| ▸ | MAOB | P27338 | 5/20 | 0.75 |
| ▸ | LMNA | P02545 | 2/20 | 0.75 |
| ▸ | TNFRSF1A | P19438 | 2/20 | 0.75 |
| ▸ | PLIN1 | O60240 | 1/20 | 0.75 |
| ▸ | BCHE | P06276 | 1/20 | 0.75 |
| ▸ | ACHE | P22303 | 1/20 | 0.75 |
| ▸ | RECQL | P46063 | 1/20 | 0.75 |
| ▸ | PLIN5 | Q00G26 | 1/20 | 0.75 |
| ▸ | ABHD5 | Q8WTS1 | 1/20 | 0.75 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.66 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.66 |
| ▸ | HSPD1 | P10809 | 3/20 | 0.66 |
| ▸ | HSPE1 | P61604 | 3/20 | 0.66 |
| ▸ | MEN1 | O00255 | 2/20 | 0.66 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.66 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.66 |
| ▸ | F3 | P13726 | 1/20 | 0.66 |
| ▸ | MAOA | P21397 | 1/20 | 0.66 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3418546 | 1.00 | CYP1B1 (0.75) | CYP1B1MAPTMAOBLMNATNFRSF1A | |
| SCHEMBL3419026 | 0.93 | CYP1B1 (0.75) | CYP1B1MAPTMAOBLMNATNFRSF1A | |
| SCHEMBL3419029 | 0.93 | CYP1B1 (0.75) | CYP1B1MAPTMAOBLMNATNFRSF1A | |
| Chalcone SCHEMBL7861207 | 0.88 | CYP1B1 (0.96) | CYP1B1MAPTMAOBLMNATNFRSF1A | |
| Chalcone SCHEMBL27827950 | 0.88 | CYP1B1 (0.96) | CYP1B1MAPTMAOBLMNATNFRSF1A | |
| Chalcone SCHEMBL27391389 | 0.88 | CYP1B1 (0.96) | CYP1B1MAPTMAOBLMNATNFRSF1A | |
| Chalcone SCHEMBL29396001 | 0.86 | CYP1B1 (1.00) | CYP1B1MAPTMAOBLMNATNFRSF1A | |
| Chalcone SCHEMBL27580 | 0.86 | CYP1B1 (1.00) | CYP1B1MAPTMAOBLMNATNFRSF1A | |
| Chalcone SCHEMBL454583 | 0.86 | CYP1B1 (1.00) | CYP1B1MAPTMAOBLMNATNFRSF1A | |
| Chalcone SCHEMBL27581 | 0.86 | CYP1B1 (1.00) | CYP1B1MAPTMAOBLMNATNFRSF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150268495-A1 | LIQUID CRYSTAL OPTICAL ELEMENT AND IMAGE DEVICE | KABUSHIKI KAISHA TOSHIBA (JP) | 2015-09-24 | — | — | US | claimed |
| EP-0096845-B1 | NOVEL COPOLYMER AND PHOTOSENSITIVE MATERIAL CONTAINING THE SAME | Daikin Kogyo Co., Ltd. (JP) | 1986-09-10 | — | — | EP | claimed |
| US-4529783-A | Fluorine containing acrylic monomer | DAIKIN KOGYO COMPANY, LTD. (JP) | 1985-07-16 | — | — | US | claimed |
| EP-0040841-B1 | PHOTOSENSITIVE MATERIAL | Daikin Kogyo Co., Ltd. (JP) | 1985-03-13 | — | — | EP | claimed |
| US-4424325-A | COPOLYMER OF PERFLUOROALKYL OR PERFLUOROALKENYL ACRYLIC MONOMER | DAIKIN KOGYO CO., LTD. (JP) | 1984-01-03 | — | — | US | claimed |
| EP-0096845-A2 | Novel copolymer and photosensitive material containing the same | Daikin Kogyo Co., Ltd. (JP) | 1983-12-28 | — | — | EP | claimed |
| EP-0040841-A1 | Photosensitive material | Daikin Kogyo Co., Ltd. (JP) | 1981-12-02 | — | — | EP | claimed |
| US-20150268495-A1 | LIQUID CRYSTAL OPTICAL ELEMENT AND IMAGE DEVICE | KABUSHIKI KAISHA TOSHIBA (JP) | 2015-09-24 | — | — | US | disclosed |
| US-8334051-B2 | Adhesion method, and biochemical chip and optical component made by the same | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2012-12-18 | — | — | US | disclosed |
| US-20100196721-A1 | ADHESION METHOD, AND BIOCHEMICAL CHIP AND OPTICAL COMPONENT MADE BY THE SAME | CRESTLINE DIRECT FINANCE, L.P. | 2010-08-05 | — | — | US | disclosed |
| US-5525457-A | Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-06-11 | — | — | US | disclosed |
| US-5525457-A | Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-06-11 | — | — | US | disclosed |
| EP-0096845-B1 | NOVEL COPOLYMER AND PHOTOSENSITIVE MATERIAL CONTAINING THE SAME | Daikin Kogyo Co., Ltd. (JP) | 1986-09-10 | — | — | EP | disclosed |
| US-4529783-A | Fluorine containing acrylic monomer | DAIKIN KOGYO COMPANY, LTD. (JP) | 1985-07-16 | — | — | US | disclosed |
| EP-0040841-B1 | PHOTOSENSITIVE MATERIAL | Daikin Kogyo Co., Ltd. (JP) | 1985-03-13 | — | — | EP | disclosed |
| US-4433152-A | ANTIINFLAMMATORY AGENT, ANTIALLERGEN OR ANTICOAGULANT | NIPPON CHEMIPHAR CO., LTD. (JP) | 1984-02-21 | — | — | US | disclosed |
| US-4424325-A | COPOLYMER OF PERFLUOROALKYL OR PERFLUOROALKENYL ACRYLIC MONOMER | DAIKIN KOGYO CO., LTD. (JP) | 1984-01-03 | — | — | US | disclosed |
| EP-0096845-A2 | Novel copolymer and photosensitive material containing the same | Daikin Kogyo Co., Ltd. (JP) | 1983-12-28 | — | — | EP | disclosed |
| EP-0040841-A1 | Photosensitive material | Daikin Kogyo Co., Ltd. (JP) | 1981-12-02 | — | — | EP | disclosed |