SCHEMBL3420693

SCHEMBL3420693

CCO[Si](OCC)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.37
TP53 P04637 1/20 0.36
RELA Q04206 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
L3MBTL1 Q9Y468 2/20 0.32
KCNH2 Q12809 1/20 0.32
GLA P06280 1/20 0.32
ALDH1A1 P00352 2/20 0.32
TSHR P16473 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
PSIP1 O75475 1/20 0.31
GAA P10253 1/20 0.31
NQO1 P15559 1/20 0.31
CA4 P22748 1/20 0.31
NPC1 O15118 1/20 0.31
MAPK1 P28482 1/20 0.31
RAB9A P51151 1/20 0.31
PIN1 Q13526 1/20 0.31
POLB P06746 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5165921 0.80 LTA4H (0.37) LTA4HTP53RELANPSR1L3MBTL1
SCHEMBL9327347 0.78 LTA4H (0.35) LTA4HTP53RELANPSR1L3MBTL1
SCHEMBL1658642 0.70 CA4 (0.41) LTA4HGLAALDH1A1TSHRMEN1
SCHEMBL27291770 0.70 TSHR (0.38) ALDH1A1TSHRMEN1KMT2AGAA
SCHEMBL5049320 0.69 LTA4H (0.43) LTA4HL3MBTL1GLAALDH1A1TSHR
Hydrochloric Acid SCHEMBL27679630 0.69 CA4 (0.39) LTA4HGLAALDH1A1TSHRMEN1
Fluoride SCHEMBL28075272 0.69 CA4 (0.39) LTA4HGLAALDH1A1TSHRMEN1
SCHEMBL28101366 0.69 MAPT (0.40) TP53NPSR1L3MBTL1TSHR
SCHEMBL28295838 0.68 ALDH1A1 (0.32) ALDH1A1TSHR
SCHEMBL17385763 0.67 LTA4H (0.43) LTA4HTP53RELAL3MBTL1KCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107531492-B Aminosilane-modified colloidal silica dispersion and method for producing same 日产化学工业株式会社 2021-03-12 CN claimed
US-10899893-B2 Aminosilane-modified colloidal silica dispersion and method of manufacturing same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2021-01-26 US claimed
US-20180355117-A1 AMINOSILANE-MODIFIED COLLOIDAL SILICA DISPERSION AND METHOD OF MANUFACTURING SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-12-13 US claimed
EP-3296262-A1 AMINOSILANE-MODIFIED COLLOIDAL SILICA DISPERSION AND METHOD OF MANUFACTURING SAME Nissan Chemical Industries, Ltd. (JP) 2018-03-21 EP claimed
CN-118878210-A Tianmu green glaze and preparation method thereof 醴陵市和兴瓷业有限公司 2024-11-01 CN disclosed
CN-112714782-B Resin composition, resin film, and laminate 日本瑞翁株式会社 2024-06-07 CN disclosed
EP-3168202-B1 LAMINATED GLASS ZEON CORP (JP) 2024-06-05 EP disclosed
EP-3432690-B1 METHOD FOR MANUFACTURING ORGANIC ELECTRONIC DEVICE SEALING BODY ZEON CORP (JP) 2024-03-27 EP disclosed
CN-112839967-B Copolymer hydride, method for producing same, composition containing copolymer hydride, and use thereof 日本瑞翁株式会社 2024-02-20 CN disclosed
CN-116948359-A Resin composition 味之素株式会社 2023-10-27 CN disclosed
US-11773193-B2 Hydrogenated copolymer and method of producing the same, hydrogenated copolymer-containing composition, interlayer film for laminated glass, interlayer film laminate for laminated glass, sealing material, optical film, medical shaped article and method of producing the same, adhesive, and assembly and method of producing the same ZEON CORPORATION (JP) 2023-10-03 US disclosed
WO-2023176456-A1 RESIN COMPOSITION AND OPTICAL FILM 日本ゼオン株式会社 2023-09-21 WO disclosed
US-20060138400-A1 Novel compounds capable of forming photoconvertible organic thin film and articles having organic thin film NIPPON SODA CO.,LTD. (JP) 2006-06-29 US disclosed
EP-1589020-A1 NOVEL COMPOUNDS CAPABLE OF FORMING PHOTOCONVERTIBLE ORGANIC THIN FILMS AND ARTICLES HAVING ORGANIC THIN FILMS NIPPON SODA CO., LTD. (JP) 2005-10-26 EP disclosed
CN-1688641-A Method for producing scratch-resistant coating systems BAYER MATERIALSCIENCE AG (DE) 2005-10-26 CN disclosed
US-20040202956-A1 a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films SEKISUI CHEMICAL CO., LTD. (JP) 2004-10-14 US disclosed
EP-1391476-A1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2004-02-25 EP disclosed
EP-0775707-B1 Ionic compounds and catalyst for olefin polymerisation using the compounds SHOWA DENKO KK (JP) 2001-11-28 EP disclosed
US-5869723-A PRODUCING HIGHLY ACTIVE POLYMER WHICH DOES NOT ATTACH TO INNER WALL OF REACTOR SHOWA DENKO K.K. (JP) 1999-02-09 US disclosed
EP-0775707-A1 IONIC COMPOUNDS AND CATALYST FOR OLEFIN POLYMERIZATION USING THE COMPOUNDS SHOWA DENKO KABUSHIKI KAISHA (JP) 1997-05-28 EP disclosed