SCHEMBL3422274

SCHEMBL3422274

O=C(c1cc(Cl)c(O)c(Cl)c1)c1cc(Cl)c(O)c(Cl)c1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 3/20 0.68
HSD17B10 Q99714 4/20 0.52
TSHR P16473 4/20 0.52
ALDH1A1 P00352 1/20 0.52
CYP3A4 P08684 1/20 0.52
RECQL P46063 1/20 0.52
THRB P10828 1/20 0.48
CYP1A2 P05177 1/20 0.46
CYP2C9 P11712 1/20 0.46
ALOX15 P16050 1/20 0.46
ALOX12 P18054 1/20 0.46
CYP2C19 P33261 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
HIF1A Q16665 1/20 0.46
ESR1 P03372 1/20 0.46
SRD5A2 P31213 1/20 0.45
AKR1C4 P17516 1/20 0.43
AKR1C3 P42330 1/20 0.43
AKR1C2 P52895 1/20 0.43
AKR1C1 Q04828 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11338682 0.93 TTR (0.60) TTRHSD17B10TSHRALDH1A1CYP3A4
SCHEMBL10893926 0.87 TTR (0.59) TTRALDH1A1SRD5A2AKR1C2AKR1C1
SCHEMBL11338660 0.87 TTR (0.54) TTRESR1SRD5A2AKR1C2AKR1C1
SCHEMBL11421443 0.87 ATM (0.56) TTRSRD5A2CNR1CNR2FASN
SCHEMBL2813230 0.84 TTR (0.50) TTRHSD17B10TSHRALDH1A1CYP3A4
SCHEMBL24419778 0.83 ALDH1A1 (0.61) TTRALDH1A1SMN1; SMN2SRD5A2AKR1C2
SCHEMBL13017386 0.82 AKR1C2 (0.64) TTRHSD17B10TSHRALDH1A1SMN1; SMN2
SCHEMBL11348009 0.82 SRD5A2 (0.50) TTRALDH1A1ESR1SRD5A2MAPK1
SCHEMBL4903616 0.81 TTR (0.65) TTRHSD17B10TSHRALDH1A1CYP3A4
SCHEMBL737305 0.81 TTR (1.00) TTRHSD17B10TSHRALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 226 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116144029-B Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device 阜阳欣奕华新材料科技股份有限公司 2025-03-18 CN claimed
CN-116144029-A Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device 阜阳欣奕华材料科技有限公司 2023-05-23 CN claimed
CN-104603176-B The co- phosphonate ester of polyester FRX聚合物股份有限公司 2018-12-28 CN claimed
US-9695278-B2 Polyester co-phosphonates FRX POLYMERS, INC. (US) 2017-07-04 US claimed
EP-2867272-A1 POLYESTER CO-PHOSPHONATES FRX Polymers, Inc. (US) 2015-05-06 EP claimed
CN-104603176-A Polyester co-phosphonates FRX POLYMERS INC 2015-05-06 CN claimed
WO-2014005136-A1 POLYESTER CO-PHOSPHONATES FRX POLYMERS, INC. (US) 2014-01-03 WO claimed
US-20140000751-A1 POLYESTER CO-PHOSPHONATES DOSKOCIL MANUFACTURING COMPANY, INC. 2014-01-02 US claimed
US-4782132-A Process for producing a copolyester MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1988-11-01 US claimed
US-4599397-A MELT-MOLDABLE MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) 1986-07-08 US claimed
US-4520208-A AND ISOPHTHALIC ACID UNITS MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) 1985-05-28 US claimed
CN-122072433-A Photosensitive resin composition for black resist, method for producing resin composition, light-shielding film, optical filter, touch panel, and display device 日铁化学材料株式会社 2026-05-22 CN disclosed
CN-113050372-B Photosensitive resin composition for black resist, light shielding film, color filter, touch panel, and display device 日铁化学材料株式会社 2026-05-12 CN disclosed
CN-111748077-B Alkali-soluble resin, hydrogenated compound, method for producing same, resin composition, cured film thereof, touch panel, and optical filter 日铁化学材料株式会社 2025-04-18 CN disclosed
CN-112162462-B Photosensitive resin composition for touch screen, cured film thereof, and touch screen having cured film thereof 日铁化学材料株式会社 2025-04-08 CN disclosed
EP-0273368-A2 Process for producing thermoset resin TEIJIN LIMITED (JP) 1988-07-06 EP disclosed
US-4609720-A GOOD MECHANICAL PROPERTIES FOR ELECTRONIC PARTS MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1986-09-02 US disclosed
US-4599397-A MELT-MOLDABLE MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) 1986-07-08 US disclosed
US-4520208-A AND ISOPHTHALIC ACID UNITS MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) 1985-05-28 US disclosed
EP-0097890-A2 Process for producing an aromatic polyester MITSUBISHI KASEI CORPORATION (JP) 1984-01-11 EP disclosed