SCHEMBL3434749

SCHEMBL3434749

O=S(=O)(C(S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)F)S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.39
CA1 P00915 5/20 0.37
MMP1 P03956 3/20 0.37
MMP2 P08253 3/20 0.37
MMP9 P14780 3/20 0.37
MMP8 P22894 3/20 0.37
MMP13 P45452 3/20 0.37
F2 P00734 2/20 0.33
PRSS1 P07477 2/20 0.33
PRSS2 P07478 2/20 0.33
PRSS3 P35030 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3435359 0.95 CA2 (0.36) CA2CA1MMP1MMP2MMP9
SCHEMBL3436096 0.95 CA2 (0.36) CA2CA1MMP1MMP2MMP9
SCHEMBL3433951 0.92 CA2 (0.34) CA2CA1MMP1MMP2MMP9
SCHEMBL2610225 0.92 CA2 (0.48) CA2CA1MMP1MMP2MMP9
SCHEMBL21405563 0.89 CA2 (0.52) CA2CA1MMP1MMP2MMP9
SCHEMBL21405565 0.89 CA2 (0.52) CA2CA1MMP1MMP2MMP9
SCHEMBL13219679 0.85 CA2 (0.43) CA2CA1MMP1MMP2MMP9
SCHEMBL2634598 0.81 CA2 (0.37) CA2CA1
SCHEMBL20886394 0.80 CA2 (0.37) CA2CA1MMP1MMP2MMP9
SCHEMBL23057228 0.78 CA2 (0.36) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024135777-A1 POLYMER ELECTROLYTE AND SECONDARY BATTERY キヤノン株式会社 2024-06-27 WO disclosed
WO-2024111618-A1 POLYMER ELECTROLYTE AND SECONDARY BATTERY キヤノン株式会社 2024-05-30 WO disclosed
WO-2024111620-A1 POLYMER ELECTROLYTE, ELECTRODE ACTIVE MATERIAL BINDER, AND SECONDARY BATTERY キヤノン株式会社 2024-05-30 WO disclosed
US-20230266666-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-24 US disclosed
US-11282709-B2 Chemical agent for forming water repellent protective film and surface treatment method for wafers CENTRAL GLASS COMPANY, LIMITED (JP) 2022-03-22 US disclosed
US-11169464-B2 Electrophotographic member, process cartridge, and electrophotographic image-forming apparatus CANON KABUSHIKI KAISHA (JP) 2021-11-09 US disclosed
US-10884352-B2 Electrophotographic member, process cartridge and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2021-01-05 US disclosed
US-20200033742-A1 ELECTROPHOTOGRAPHIC MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC IMAGE-FORMING APPARATUS CANON KABUSHIKI KAISHA (JP) 2020-01-30 US disclosed
US-20190302644-A1 ELECTROPHOTOGRAPHIC MEMBER, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC APPARATUS CANON KABUSHIKI KAISHA (JP) 2019-10-03 US disclosed
US-9069245-B2 Near-infrared absorptive layer-forming composition and multilayer film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-30 US disclosed
US-20120094235-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-04-19 US disclosed
US-20110262862-A1 NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-10-27 US disclosed
US-20080081292-A1 RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-04-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230266666-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-0, H1-4, CHRM1 CA2 37/4885CA1 88/4885MMP1 3671/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.